Inventor · disambiguated record
Shigenori Sakamori
Also filed as: SAKAMORI SHIGENORI
10 granted patents·2 pending applications·203 citations·filing 1996–2002
90Inventor score
Top patents by PatentIndex Score
12 records- 0184US6156152APlasma processing apparatusMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Dec 5, 2000·45 cites·6 claims
- 0277US6232209B1Semiconductor device and manufacturing method thereofMITSUBISHI ELECTRIC CORP·Filed 1999·Granted May 15, 2001·58 cites·7 claims
- 0372US5668052AMethod of manufacturing semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Sep 16, 1997·37 cites·8 claims
- 0450US6638777B2Apparatus for and method of etchingMITSUBISHI ELECTRIC CORP·Filed 2002·Granted Oct 28, 2003·3 cites·14 claims
- 0550US6340844B1Semiconductor device having improved contact hole structure, and method of manufacturing the sameMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Jan 22, 2002·4 cites·6 claims
- 0650US5877081AMethod of manufacturing semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Mar 2, 1999·14 cites·8 claims
- 0749US6731008B1Semiconductor device with conductive contact layer structureRENESAS TECH CORP·Filed 1996·Granted May 4, 2004·16 cites·13 claims
- 0846US6686269B2Semiconductor device having improved contact hole structure, and method of manufacturing the sameRENESAS TECH CORP·Filed 2002·Granted Feb 3, 2004·2 cites·9 claims
- 0943US6346482B2Semiconductor device having an improved contact structure and a manufacturing method thereofMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Feb 12, 2002·13 cites·14 claims
- 1041US6156639AMethod for manufacturing contact structureMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Dec 5, 2000·11 cites·13 claims
- 1135US2002192971A1Plasma processing apparatus and processing method using the same, and manufacturing method of semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2001·Application pending·0 cites
- 1234US2001052319A1Plasma processing apparatus and plasma processing methodMITSUBISHI ELECTRIC CORP·Filed 2000·Application pending·0 cites
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