Inventor · disambiguated record
Tadahito Matsuda
Also filed as: MATSUDA TADAHITO
9 granted patents·124 citations·filing 1981–2003
89Inventor score
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9 records- 0177US6841334B2Onium salts and positive resist materials using the sameSHINETSU CHEMICAL CO·Filed 2003·Granted Jan 11, 2005·6 cites·11 claims
- 0270US5624787AChemically amplified positive resist compositionSHINETSU CHEMICAL CO·Filed 1995·Granted Apr 29, 1997·31 cites·22 claims
- 0366US5636004AProjection exposure method and apparatusNIPPON TELEGRAPH & TELEPHONE·Filed 1995·Granted Jun 3, 1997·31 cites·16 claims
- 0457US4634645AMethod of forming resist micropatternNIPPON TELEGRAPH & TELEPHONE·Filed 1985·Granted Jan 6, 1987·18 cites·23 claims
- 0551US4808829AMark position detection system for use in charged particle beam apparatusHITACHI LTD·Filed 1987·Granted Feb 28, 1989·8 cites·4 claims
- 0647US5414746AX-ray exposure mask and fabrication method thereofNIPPON TELEGRAPH & TELEPHONE·Filed 1993·Granted May 9, 1995·11 cites·18 claims
- 0746US6667415B1Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the sameSHINETSU CHEMICAL CO·Filed 1994·Granted Dec 23, 2003·2 cites·16 claims
- 0846US4437008AElectron beam control systemNIPPON TELEGRAPH & TELEPHONE·Filed 1981·Granted Mar 13, 1984·5 cites·4 claims
- 0944US4489241AExposure method with electron beam exposure apparatusHITACHI LTD·Filed 1982·Granted Dec 18, 1984·12 cites·13 claims
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