Inventor · disambiguated record
Song-Yuan Chang
Also filed as: CHANG SONG Y · CHANG SONG-YUAN
17 granted patents·5 pending applications·117 citations·filing 1992–2019
92Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD5CHANG SONG-YUAN4UWIZ TECH CO LTD4UWIZ TECHNOLOGY CO LTD3CHANG SONG Y1
Top patents by PatentIndex Score
22 records- 0189US9994736B2Slurry composition for chemical mechanical polishing of GE-based materials and devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 12, 2018·4 cites·20 claims
- 0288US9530655B2Slurry composition for chemical mechanical polishing of Ge-based materials and devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Dec 27, 2016·6 cites·20 claims
- 0386US9416297B2Chemical mechanical polishing method using slurry composition containing N-oxide compoundTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Aug 16, 2016·7 cites·20 claims
- 0483US5452123AMethod of making an optically nonlinear switched optical device and related devicesUNIV PITTSBURGH·Filed 1992·Granted Sep 19, 1995·70 cites·57 claims
- 0578US8337716B2Sarcosine compound used as corrosion inhibitorCHANG SONG-YUAN·Filed 2008·Granted Dec 25, 2012·6 cites·4 claims
- 0677US9039925B2Polishing slurry compositionCHEN WEI-JUNG·Filed 2012·Granted May 26, 2015·6 cites·24 claims
- 0775US8641920B2Polishing composition for planarizing metal layerCHANG SONG-YUAN·Filed 2009·Granted Feb 4, 2014·6 cites·13 claims
- 0874US9165760B2Cleaning composition and cleaning method using the sameUWIZ TECHNOLOGY CO LTD·Filed 2013·Granted Oct 20, 2015·4 cites·13 claims
- 0974US7763577B1Acidic post-CMP cleaning compositionUWIZ TECHNOLOGY CO LTD·Filed 2009·Granted Jul 27, 2010·5 cites·10 claims
- 1069US9881803B2Chemical mechanical polishing method using slurry composition containing N-oxide compoundTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 30, 2018·1 cites·20 claims
- 1164US8901001B2Slurry composition and method of fabricating damascene structure using the sameCHANG SONG-YUAN·Filed 2009·Granted Dec 2, 2014·2 cites·23 claims
- 1260US11193043B2System for chemical mechanical polishing of Ge-based materials and devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 7, 2021·0 cites·20 claims
- 1350US10373842B2Composition and method used for chemical mechanical planarization of metalsVERSUM MAT US LLC·Filed 2015·Granted Aug 6, 2019·0 cites·20 claims
- 1446US2008254629A1Composition and method used for chemical mechanical planarization of metalsCHANG SONG Y·Filed 2008·Application pending·0 cites
- 1544US10501660B2Method of selectively removing tungsten over silicon oxideUWIZ TECH CO LTD·Filed 2019·Granted Dec 10, 2019·0 cites·8 claims
- 1644US9718991B2Chemical mechanical polishing slurryUWIZ TECH CO LTD·Filed 2015·Granted Aug 1, 2017·0 cites·8 claims
- 1744US2010193728A1Chemical Mechanical Polishing CompositionCHANG SONG-YUAN·Filed 2008·Application pending·0 cites
- 1842US8747693B2Silica having metal ions absorbed thereon and fabricating method thereofHO YUN-LUNG·Filed 2012·Granted Jun 10, 2014·0 cites·20 claims
- 1939US2011160112A1Cleaning compositionUWIZ TECHNOLOGY CO LTD·Filed 2010·Application pending·0 cites
- 2035US2004175942A1Composition and method used for chemical mechanical planarization of metalsFiled 2003·Application pending·0 cites
- 2134US9493678B2Polishing compositionUWIZ TECH CO LTD·Filed 2015·Granted Nov 15, 2016·0 cites·9 claims
- 2231US2017253766A1Slurry composition, use thereof, and polishing methodUWIZ TECH CO LTD·Filed 2016·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →