Inventor · disambiguated record
Michitaka Ootani
Also filed as: OOTANI MICHITAKA
29 granted patents·2 pending applications·265 citations·filing 2000–2021
96Inventor score
Files withSHINETSU CHEMICAL CO14CENTRAL GLASS CO LTD12ISHII AKIHIRO1KOMORIYA HARUHIKO1PANASONIC CORP1
Top patents by PatentIndex Score
31 records- 0198US7354693B2Polymer, resist protective coating material, and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted Apr 8, 2008·54 cites·8 claims
- 0291US7276623B2Polymerizable ester compoundsCENTRAL GLASS CO LTD·Filed 2006·Granted Oct 2, 2007·10 cites·3 claims
- 0390US7402626B2Top coat compositionCENTRAL GLASS CO LTD·Filed 2004·Granted Jul 22, 2008·31 cites·11 claims
- 0488US7488567B2Polymer, resist composition and patterning processPANASONIC CORP·Filed 2006·Granted Feb 10, 2009·9 cites·20 claims
- 0587US7666967B2Ester compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Feb 23, 2010·5 cites·4 claims
- 0683US6710148B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Mar 23, 2004·20 cites·20 claims
- 0782US8450520B2Process for preparation of 2-fluoroacrylic estersISHII AKIHIRO·Filed 2010·Granted May 28, 2013·3 cites·11 claims
- 0875US6872514B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Mar 29, 2005·13 cites·16 claims
- 0975US6723485B1Positive resist composition and process for forming resist pattern using sameCENTRAL GLASS CO LTD·Filed 2000·Granted Apr 20, 2004·13 cites·39 claims
- 1070US6511787B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 28, 2003·25 cites·7 claims
- 1168US6414167B1Octafluorotricyclodecane derivatives and processes for producing sameCENTRAL GLASS CO LTD·Filed 2001·Granted Jul 2, 2002·4 cites·21 claims
- 1264US7169869B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2005·Granted Jan 30, 2007·1 cites·8 claims
- 1364US6824955B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Nov 30, 2004·7 cites·11 claims
- 1462US6916592B2Esters, polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2003·Granted Jul 12, 2005·16 cites·20 claims
- 1561US6861197B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Mar 1, 2005·6 cites·22 claims
- 1659US6582880B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jun 24, 2003·14 cites·20 claims
- 1758US6680389B2Ester compoundsSIHN ETSU CHEMICAL CO LTD·Filed 2002·Granted Jan 20, 2004·2 cites·16 claims
- 1856US6933095B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2002·Granted Aug 23, 2005·3 cites·15 claims
- 1955US8115036B2Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming patternKOMORIYA HARUHIKO·Filed 2010·Granted Feb 14, 2012·0 cites·11 claims
- 2055US7569323B2Resist protective coating material and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Aug 4, 2009·4 cites·20 claims
- 2154US7736835B2Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming patternCENTRAL GLASS CO LTD·Filed 2005·Granted Jun 15, 2010·0 cites·12 claims
- 2254US6864037B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Mar 8, 2005·11 cites·18 claims
- 2352US11987772B2Solvent compositionCENTRAL GLASS CO LTD·Filed 2021·Granted May 21, 2024·0 cites·9 claims
- 2452US7378218B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted May 27, 2008·3 cites·7 claims
- 2549US7005228B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2002·Granted Feb 28, 2006·2 cites·18 claims
- 2647US6855477B2Chemically amplified resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Feb 15, 2005·1 cites·5 claims
- 2746US6603037B2Ester compoundsSHINETSU CHEMICAL CO·Filed 2002·Granted Aug 5, 2003·0 cites·2 claims
- 2843US6946235B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2003·Granted Sep 20, 2005·4 cites·6 claims
- 2942US6790586B2Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Sep 14, 2004·4 cites·11 claims
- 3042US2007087125A1Process for producing top coat film used in lithographyCENTRAL GLASS CO LTD·Filed 2005·Application pending·0 cites
- 3138US2004023176A1Fluorinated polymerFiled 2003·Application pending·0 cites
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