Inventor · disambiguated record
Jin Amanokura
Also filed as: AMANOKURA JIN
8 granted patents·5 pending applications·47 citations·filing 1998–2013
84Inventor score
Top patents by PatentIndex Score
13 records- 0185US8084363B2Polishing slurry and polishing methodAMANOKURA JIN·Filed 2009·Granted Dec 27, 2011·10 cites·6 claims
- 0277US8084362B2Polishing slurry and polishing methodAMANOKURA JIN·Filed 2007·Granted Dec 27, 2011·5 cites·5 claims
- 0373US8501625B2Polishing liquid for metal film and polishing methodHAGA KOUJI·Filed 2008·Granted Aug 6, 2013·4 cites·5 claims
- 0471US8481428B2Polishing slurry and polishing methodAMANOKURA JIN·Filed 2011·Granted Jul 9, 2013·2 cites·7 claims
- 0566US9799532B2CMP polishing solution and polishing methodMINAMI HISATAKA·Filed 2011·Granted Oct 24, 2017·2 cites·22 claims
- 0663US10796921B2CMP fluid and method for polishing palladiumMINAMI HISATAKA·Filed 2010·Granted Oct 6, 2020·2 cites·18 claims
- 0762US6060215APhotosensitive resin composition and application of its photosensitivityHITACHI CHEMICAL CO LTD·Filed 1998·Granted May 9, 2000·22 cites·15 claims
- 0853US2010216309A1Cmp polishing liquid and method for polishing substrate using the sameHITACHI CHEMICAL CO LTD·Filed 2008·Application pending·0 cites
- 0951US2014017893A1Cmp polishing liquid and method for polishing substrate using the sameHITACHI CHEMICAL CO LTD·Filed 2013·Application pending·0 cites
- 1050US2013217229A1Polishing liquid for metal film and polishing methodHITACHI CHEMICAL CO LTD·Filed 2013·Application pending·0 cites
- 1145US8821750B2Metal polishing slurry and polishing methodAMANOKURA JIN·Filed 2008·Granted Sep 2, 2014·0 cites·21 claims
- 1245US2011027997A1Polishing liquid for cmp and polishing methodHITACHI CHEMICAL CO LTD·Filed 2009·Application pending·0 cites
- 1339US2005050803A1Polishing fluid and polishing methodFiled 2002·Application pending·0 cites
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