Inventor · disambiguated record
Alexander Tregub
Also filed as: TREGUB ALEXANDER · TREGUB ALEXANDER ALEX
11 granted patents·9 pending applications·81 citations·filing 2002–2016
89Inventor score
Top patents by PatentIndex Score
20 records- 0192US7383723B2Detecting particle agglomeration in chemical mechanical polishing slurriesINTEL CORP·Filed 2005·Granted Jun 10, 2008·22 cites·24 claims
- 0284US7469443B2Brush for cleaning waferINTEL CORP·Filed 2005·Granted Dec 30, 2008·11 cites·4 claims
- 0378US7048610B1Conditioning polishing pad for chemical-mechanical polishingINTEL CORP·Filed 2005·Granted May 23, 2006·10 cites·30 claims
- 0472US7264853B2Attaching a pellicle frame to a reticleINTEL CORP·Filed 2003·Granted Sep 4, 2007·16 cites·17 claims
- 0565US7314667B2Process to optimize properties of polymer pellicles and resist for lithography applicationsINTEL CORP·Filed 2004·Granted Jan 1, 2008·12 cites·15 claims
- 0662US8012651B2Mounting a pellicle to a frameINTEL CORP·Filed 2007·Granted Sep 6, 2011·2 cites·16 claims
- 0757US7316869B2Mounting a pellicle to a frameINTEL CORP·Filed 2003·Granted Jan 8, 2008·5 cites·23 claims
- 0854US2007037074A1Use of alternative polymer materials for "soft" polymer pelliclesTREGUB ALEXANDER·Filed 2006·Application pending·0 cites
- 0949US7288299B2Fullerenes to increase radiation resistance in polymer-based pelliclesINTEL CORP·Filed 2003·Granted Oct 30, 2007·3 cites·12 claims
- 1046US7288300B2Fullerenes to increase radiation resistance in polymer-based pelliclesINTEL CORP·Filed 2005·Granted Oct 30, 2007·0 cites·6 claims
- 1143US8551675B2Mounting a pellicle to a frameESCHBACH FLORENCE·Filed 2011·Granted Oct 8, 2013·0 cites·5 claims
- 1243US2019193245A1Chemical-mechanical planarization (cmp) pad conditioner brush-and-abrasive hybrid for multi-step, preparation- and restoration-conditioning process of cmp padINTEL CORP·Filed 2016·Application pending·0 cites
- 1339US2005202252A1Use of alternative polymer materials for "soft" polymer pelliclesFiled 2004·Application pending·0 cites
- 1439US2003207661A1Annealing of CMP polishing padsFiled 2002·Application pending·0 cites
- 1538US7763395B2Radiation stability of polymer pelliclesINTEL CORP·Filed 2003·Granted Jul 27, 2010·0 cites·18 claims
- 1638US2005287032A1Anti-bacterial protection to improve performance of post CMP clean brushTREGUB ALEXANDER·Filed 2004·Application pending·0 cites
- 1738US2007117393A1Hardened porous polymer chemical mechanical polishing (CMP) padTREGUB ALEXANDER·Filed 2005·Application pending·0 cites
- 1834US2004040575A1Brush for cleaning/scrubbing a substrateFiled 2002·Application pending·0 cites
- 1931US2007003695A1Method of manufacturing a polymer memory deviceTREGUB ALEXANDER·Filed 2005·Application pending·0 cites
- 2028US2006291530A1Treatment of CMP pad window to improve transmittanceTREGUB ALEXANDER·Filed 2005·Application pending·0 cites
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