Inventor · disambiguated record
Yutaka Motoyama
Also filed as: MOTOYAMA YUTAKA
18 granted patents·6 pending applications·12 citations·filing 2010–2024
88Inventor score
Top patents by PatentIndex Score
24 records- 0180US11062904B2Method of forming polysilicon film and film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Jul 13, 2021·2 cites·7 claims
- 0277US9970111B2Substrate processing apparatus having ground electrodeTOKYO ELECTRON LTD·Filed 2014·Granted May 15, 2018·1 cites·6 claims
- 0361US8608902B2Plasma processing apparatusFUKUSHIMA KOHEI·Filed 2010·Granted Dec 17, 2013·2 cites·17 claims
- 0460US11587787B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Feb 21, 2023·0 cites·12 claims
- 0559US10676820B2Cleaning method and film forming methodTOKYO ELECTRON LTD·Filed 2018·Granted Jun 9, 2020·0 cites·12 claims
- 0659US2024327984A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0758US12191140B2Method for manufacturing semiconductor device and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jan 7, 2025·0 cites·15 claims
- 0858US11239076B2Film forming method and heat treatment apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Feb 1, 2022·0 cites·13 claims
- 0955US12131947B2Method for manufacturing semiconductor device and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Oct 29, 2024·0 cites·8 claims
- 1054US11851752B2Method for forming silicon film and processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Dec 26, 2023·0 cites·9 claims
- 1151US2022189785A1Method for manufacturing semiconductor device and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1250US12027384B2Heat treatment apparatus and dummy substrate processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Jul 2, 2024·0 cites·6 claims
- 1349US9487859B2Operating method of vertical heat treatment apparatus, storage medium, and vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Nov 8, 2016·0 cites·9 claims
- 1446USD786810SDummy waferTOKYO ELECTRON LTD·Filed 2015·Granted May 16, 2017·4 cites·1 claims
- 1544US9373498B2Method of operating vertical heat treatment apparatus, vertical heat treatment apparatus and non-transitory recording mediumTOKYO ELECTRON LTD·Filed 2014·Granted Jun 21, 2016·0 cites·4 claims
- 1643US9776202B2Driving method of vertical heat treatment apparatus, storage medium and vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Oct 3, 2017·0 cites·2 claims
- 1743US2016024654A1Film Forming ApparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 1842US2015275368A1Film Forming Apparatus Using Gas NozzlesTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 1941US11807938B2Exhaust device, processing system, and processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Nov 7, 2023·0 cites·7 claims
- 2038USD784937SDummy waferTOKYO ELECTRON LTD·Filed 2015·Granted Apr 25, 2017·2 cites·1 claims
- 2137US10957535B2Semiconductor film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Mar 23, 2021·0 cites·13 claims
- 2234USD785576SDummy waferTOKYO ELECTRON LTD·Filed 2015·Granted May 2, 2017·1 cites·1 claims
- 2333US2015259799A1Vertical heat treatment apparatus, method of operating vertical heat treatment apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 2430US2015376789A1Vertical heat treatment apparatus and method of operating vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →