Inventor · disambiguated record
Brian A. Vaartstra
Also filed as: POMBRIK SOFIA · VAARTSTRA BRIAN · VAARTSTRA BRIAN A · VAARTSTRA BRIAN ANTHONY
163 granted patents·22 pending applications·10,529 citations·filing 1992–2024
99Inventor score
Files withMICRON TECHNOLOGY INC137SEMICONDUCTOR COMPONENTS IND LLC17VAARTSTRA BRIAN A10ADVANCED TECH MATERIALS7APTINA IMAGING CORP3
Top patents by PatentIndex Score
185 records- 0199US7332442B2Systems and methods for forming metal oxide layersMICRON TECHNOLOGY INC·Filed 2006·Granted Feb 19, 2008·126 cites·21 claims
- 0299US7041609B2Systems and methods for forming metal oxides using alcoholsMICRON TECHNOLOGY INC·Filed 2002·Granted May 9, 2006·629 cites·40 claims
- 0399US6149828ASupercritical etching compositions and method of using sameMICRON TECHNOLOGY INC·Filed 1997·Granted Nov 21, 2000·457 cites·13 claims
- 0498US7544615B2Systems and methods of forming refractory metal nitride layers using organic aminesMICRON TECHNOLOGY INC·Filed 2007·Granted Jun 9, 2009·61 cites·24 claims
- 0598US7410918B2Systems and methods for forming metal oxides using alcoholsMICRON TECHNOLOGY INC·Filed 2006·Granted Aug 12, 2008·80 cites·25 claims
- 0698US7300870B2Systems and methods of forming refractory metal nitride layers using organic aminesMICRON TECHNOLOGY INC·Filed 2005·Granted Nov 27, 2007·83 cites·28 claims
- 0798US7294556B2Method of forming trench isolation in the fabrication of integrated circuitryMICRON TECHNOLOGY INC·Filed 2005·Granted Nov 13, 2007·73 cites·21 claims
- 0898US7125815B2Methods of forming a phosphorous doped silicon dioxide comprising layerMICRON TECHNOLOGY INC·Filed 2003·Granted Oct 24, 2006·145 cites·42 claims
- 0998US7122464B2Systems and methods of forming refractory metal nitride layers using disilazanesMICRON TECHNOLOGY INC·Filed 2004·Granted Oct 17, 2006·184 cites·38 claims
- 1098US7115528B2Systems and method for forming silicon oxide layersMICRON TECHNOLOGY INC·Filed 2003·Granted Oct 3, 2006·166 cites·56 claims
- 1198US6995081B2Systems and methods for forming tantalum silicide layersMICRON TECHNOLOGY INC·Filed 2002·Granted Feb 7, 2006·135 cites·30 claims
- 1298US6984592B2Systems and methods for forming metal-doped aluminaMICRON TECHNOLOGY INC·Filed 2002·Granted Jan 10, 2006·146 cites·46 claims
- 1398US6967159B2Systems and methods for forming refractory metal nitride layers using organic aminesMICRON TECHNOLOGY INC·Filed 2002·Granted Nov 22, 2005·151 cites·23 claims
- 1498US6794284B2Systems and methods for forming refractory metal nitride layers using disilazanesMICRON TECHNOLOGY INC·Filed 2002·Granted Sep 21, 2004·168 cites·70 claims
- 1598US6730163B2Aluminum-containing material and atomic layer deposition methodsMICRON TECHNOLOGY INC·Filed 2002·Granted May 4, 2004·157 cites·29 claims
- 1698US6730164B2Systems and methods for forming strontium- and/or barium-containing layersMICRON TECHNOLOGY INC·Filed 2002·Granted May 4, 2004·173 cites·60 claims
- 1798US6673701B1Atomic layer deposition methodsMICRON TECHNOLOGY INC·Filed 2002·Granted Jan 6, 2004·223 cites·36 claims
- 1898US6452017B1Complexes having tris(pyrazolyl)methanate ligandsMICRON TECHNOLOGY INC·Filed 2000·Granted Sep 17, 2002·288 cites·26 claims
- 1997US7368402B2Systems and methods for forming tantalum oxide layers and tantalum precursor compoundsMICRON TECHNOLOGY INC·Filed 2004·Granted May 6, 2008·97 cites·23 claims
- 2097US7271077B2Deposition methods with time spaced and time abutting precursor pulsesMICRON TECHNOLOGY INC·Filed 2003·Granted Sep 18, 2007·82 cites·64 claims
- 2197US7253122B2Systems and methods for forming metal oxides using metal diketonates and/or ketoiminesMICRON TECHNOLOGY INC·Filed 2002·Granted Aug 7, 2007·95 cites·46 claims
- 2297US7250367B2Deposition methods using heteroleptic precursorsMICRON TECHNOLOGY INC·Filed 2004·Granted Jul 31, 2007·140 cites·45 claims
- 2397US7196007B2Systems and methods of forming refractory metal nitride layers using disilazanesMICRON TECHNOLOGY INC·Filed 2004·Granted Mar 27, 2007·113 cites·33 claims
- 2497US7115166B2Systems and methods for forming strontium- and/or barium-containing layersMICRON TECHNOLOGY INC·Filed 2004·Granted Oct 3, 2006·130 cites·54 claims
- 2597US7087481B2Systems and methods for forming metal oxides using metal compounds containing aminosilane ligandsMICRON TECHNOLOGY INC·Filed 2002·Granted Aug 8, 2006·101 cites·25 claims
- 2697US7030042B2Systems and methods for forming tantalum oxide layers and tantalum precursor compoundsMICRON TECHNOLOGY INC·Filed 2002·Granted Apr 18, 2006·116 cites·31 claims
- 2797US6958300B2Systems and methods for forming metal oxides using metal organo-amines and metal organo-oxidesMICRON TECHNOLOGY INC·Filed 2002·Granted Oct 25, 2005·117 cites·30 claims
- 2897US6863725B2Method of forming a Ta2O5 comprising layerMICRON TECHNOLOGY INC·Filed 2003·Granted Mar 8, 2005·109 cites·70 claims
- 2997US6784049B2Method for forming refractory metal oxide layers with tetramethyldisiloxaneMICRON TECHNOLOGY INC·Filed 2002·Granted Aug 31, 2004·130 cites·43 claims
- 3097US6682602B2Chemical vapor deposition systems including metal complexes with chelating O- and/or N-donor ligandsMICRON TECHNOLOGY INC·Filed 2002·Granted Jan 27, 2004·117 cites·20 claims
- 3197US6455717B1Metal complexes with chelating O-and/or N-donor ligandsMICRON TECHNOLOGY INC·Filed 2000·Granted Sep 24, 2002·96 cites·26 claims
- 3297US6445023B1Mixed metal nitride and boride barrier layersMICRON TECHNOLOGY INC·Filed 1999·Granted Sep 3, 2002·185 cites·41 claims
- 3397US6242165B1Supercritical compositions for removal of organic material and methods of using sameMICRON TECHNOLOGY INC·Filed 1998·Granted Jun 5, 2001·214 cites·30 claims
- 3497US6063705APrecursor chemistries for chemical vapor deposition of ruthenium and ruthenium oxideMICRON TECHNOLOGY INC·Filed 1998·Granted May 16, 2000·236 cites·71 claims
- 3597US5962716AMethods for preparing ruthenium and osmium compoundsMICRON TECHNOLOGY INC·Filed 1998·Granted Oct 5, 1999·94 cites·15 claims
- 3697US5908947ADifunctional amino precursors for the deposition of films comprising metalsMICRON TECHNOLOGY INC·Filed 1997·Granted Jun 1, 1999·137 cites·41 claims
- 3796US9354159B2Opto-fluidic system with coated fluid channelsNANOSCOPIA CAYMAN INC·Filed 2013·Granted May 31, 2016·39 cites·18 claims
- 3896US7374617B2Atomic layer deposition methods and chemical vapor deposition methodsMICRON TECHNOLOGY INC·Filed 2002·Granted May 20, 2008·85 cites·26 claims
- 3996US7112485B2Systems and methods for forming zirconium and/or hafnium-containing layersMICRON TECHNOLOGY INC·Filed 2002·Granted Sep 26, 2006·103 cites·33 claims
- 4096US7077902B2Atomic layer deposition methodsMICRON TECHNOLOGY INC·Filed 2004·Granted Jul 18, 2006·93 cites·20 claims
- 4196US6368398B2Method of depositing films by using carboxylate complexesMICRON TECHNOLOGY INC·Filed 2001·Granted Apr 9, 2002·96 cites·54 claims
- 4296US6273951B1Precursor mixtures for use in preparing layers on substratesMICRON TECHNOLOGY INC·Filed 1999·Granted Aug 14, 2001·154 cites·28 claims
- 4396US6244575B1Method and apparatus for vaporizing liquid precursors and system for using sameMICRON TECHNOLOGY INC·Filed 1996·Granted Jun 12, 2001·165 cites·62 claims
- 4496US6225237B1Method for forming metal-containing films using metal complexes with chelating O- and/or N-donor ligandsMICRON TECHNOLOGY INC·Filed 1998·Granted May 1, 2001·156 cites·19 claims
- 4596US6110529AMethod of forming metal films on a substrate by chemical vapor depositionADVANCED TECH MATERIALS·Filed 1995·Granted Aug 29, 2000·276 cites·38 claims
- 4696US5820664APrecursor compositions for chemical vapor deposition, and ligand exchange resistant metal-organic precursor solutions comprising sameADVANCED TECH MATERIALS·Filed 1995·Granted Oct 13, 1998·266 cites·19 claims
- 4795US7678708B2Systems and methods for forming metal oxide layersMICRON TECHNOLOGY INC·Filed 2009·Granted Mar 16, 2010·17 cites·28 claims
- 4895US6666986B1Supercritical etching compositions and method of using sameMICRON TECHNOLOGY INC·Filed 2000·Granted Dec 23, 2003·82 cites·19 claims
- 4995US6576778B1Methods for preparing ruthenium and osmium compoundsMICRON TECHNOLOGY INC·Filed 2000·Granted Jun 10, 2003·31 cites·26 claims
- 5095US6348412B1Organometallic compound mixtures in chemical vapor depositionMICRON TECHNOLOGY INC·Filed 2000·Granted Feb 19, 2002·68 cites·20 claims
Showing the top 50 of 185 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →