Inventor · disambiguated record
Ina Stankeviciene
Also filed as: STANKEVICIENE INA
7 granted patents·4 pending applications·28 citations·filing 2006–2023
80Inventor score
Files withLAM RES CORP7VALSTYBINIS MOKSLINIU TYRIMU INSTITUTAS FIZINIU IR TECH MOKSLU CENTRAS3VALSTYBINIS MOKSLINIU TYRIMU INSTITUTAS FIZINIU IR TECH MOSKLU CENTRAS1
Top patents by PatentIndex Score
11 records- 0192US9469902B2Electroless deposition of continuous platinum layerLAM RES CORP·Filed 2014·Granted Oct 18, 2016·13 cites·26 claims
- 0288US7794530B2Electroless deposition of cobalt alloysLAM RES CORP·Filed 2006·Granted Sep 14, 2010·10 cites·13 claims
- 0373US9428836B2Electroless deposition of continuous cobalt layer using complexed Ti3+ metal ions as reducing agentsLAM RES CORP·Filed 2014·Granted Aug 30, 2016·3 cites·20 claims
- 0463US9499913B2Electroless deposition of continuous platinum layer using complexed Co2+ metal ion reducing agentLAM RES CORP·Filed 2014·Granted Nov 22, 2016·1 cites·20 claims
- 0563US2025075330A1Plating solution for high rate electroless deposition of copperVALSTYBINIS MOKSLINIU TYRIMU INSTITUTAS FIZINIU IR TECH MOSKLU CENTRAS·Filed 2023·Application pending·0 cites
- 0660US10982328B2Method for formation of electro-conductive traces on polymeric article surfaceVALSTYBINIS MOKSLINIU TYRIMU INSTITUTAS FIZINIU IR TECH MOKSLU CENTRAS·Filed 2017·Granted Apr 20, 2021·1 cites·11 claims
- 0759US12336114B2Method for selective metallisation of inorganic dielectrics or semiconductorsVALSTYBINIS MOKSLINIU TYRIMU INSTITUTAS FIZINIU IR TECH MOKSLU CENTRAS·Filed 2023·Granted Jun 17, 2025·0 cites·21 claims
- 0859US7988774B2Electroless deposition of cobalt alloysLAM RES CORP·Filed 2010·Granted Aug 2, 2011·0 cites·17 claims
- 0954US2015307994A1ELECTROLESS DEPOSITION OF CONTINUOUS NICKEL LAYER USING COMPLEXED Ti3+ METAL IONS AS REDUCING AGENTSLAM RES CORP·Filed 2014·Application pending·0 cites
- 1047US2022064801A1Method for electroless nickel deposition onto copper without activation with palladiumVALSTYBINIS MOKSLINIU TYRIMU INSTITUTAS FIZINIU IR TECH MOKSLU CENTRAS·Filed 2020·Application pending·0 cites
- 1142US2015307995A1ELECTROLESS DEPOSITION OF CONTINUOUS PALLADIUM LAYER USING COMPLEXED Co2+ METAL IONS OR Ti3+ METAL IONS AS REDUCING AGENTSLAM RES CORP·Filed 2014·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →