Inventor · disambiguated record
Kazuhiro Morimitsu
Also filed as: MORIMITSU KAZUHIRO
14 granted patents·6 pending applications·1,005 citations·filing 2001–2025
92Inventor score
Files withHITACHI INT ELECTRIC INC13KOKUSAI ELECTRIC CORP4FUKUDA MASANAO1HIROCHI YUKITOMO1SATO AKIHIRO1
Top patents by PatentIndex Score
20 records- 0198US9412582B2Reaction tube, substrate processing apparatus, and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2015·Granted Aug 9, 2016·464 cites·14 claims
- 0296US10424520B1Method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2019·Granted Sep 24, 2019·15 cites·9 claims
- 0396US7198447B2Semiconductor device producing apparatus and producing method of semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2003·Granted Apr 3, 2007·462 cites·11 claims
- 0495US9487863B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2015·Granted Nov 8, 2016·8 cites·8 claims
- 0585US9074284B2Heat treatment apparatusFUKUDA MASANAO·Filed 2010·Granted Jul 7, 2015·7 cites·12 claims
- 0684US9064695B1Substrate processing apparatus, non-transitory computer-readable recording medium and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2014·Granted Jun 23, 2015·5 cites·8 claims
- 0782US9163309B2Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumHITACHI INT ELECTRIC INC·Filed 2014·Granted Oct 20, 2015·5 cites·17 claims
- 0881US9070554B2Method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumHITACHI INT ELECTRIC INC·Filed 2014·Granted Jun 30, 2015·4 cites·19 claims
- 0977US6737613B2Heat treatment apparatus and method for processing substratesHITACHI INT ELECTRIC INC·Filed 2003·Granted May 18, 2004·21 cites·8 claims
- 1070US7455734B2Substrate processing apparatus, substrate holder, and manufacturing method of semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2004·Granted Nov 25, 2008·13 cites·22 claims
- 1161US10978361B2Substrate processing apparatus and recording mediumKOKUSAI ELECTRIC CORP·Filed 2019·Granted Apr 13, 2021·0 cites·17 claims
- 1257US9084298B2Substrate processing apparatus including shielding unit for suppressing leakage of magnetic fieldHIROCHI YUKITOMO·Filed 2011·Granted Jul 14, 2015·1 cites·7 claims
- 1357US2025308944A1Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2025·Application pending·0 cites
- 1452US2009029561A1Semiconductor processing apparatusHITACHI INT ELECTRIC INC·Filed 2008·Application pending·0 cites
- 1550US9502236B2Substrate processing apparatus, non-transitory computer-readable recording medium and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2015·Granted Nov 22, 2016·0 cites·13 claims
- 1648US10714316B2Method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2018·Granted Jul 14, 2020·0 cites·19 claims
- 1746US2010282166A1Heat treatment apparatus and method of heat treatmentHITACHI INT ELECTRIC INC·Filed 2010·Application pending·0 cites
- 1845US2011253049A1Semiconductor processing apparatusHITACHI INT ELECTRIC INC·Filed 2011·Application pending·0 cites
- 1937US2011306212A1Substrate processing apparatus, semiconductor device manufacturing method and substrate manufacturing methodSATO AKIHIRO·Filed 2011·Application pending·0 cites
- 2034US2002012581A1Substrate processing apparatus and method for manufacturing a semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2001·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →