Inventor · disambiguated record
Derek Bassett
Also filed as: BASSETT DEREK · BASSETT DEREK W · BASSETT DEREK WILLIAM
9 granted patents·6 pending applications·6 citations·filing 2013–2024
78Inventor score
Files withTOKYO ELECTRON LTD15
Top patents by PatentIndex Score
15 records- 0177US10262880B2Cover plate for wind mark control in spin coating processTOKYO ELECTRON LTD·Filed 2013·Granted Apr 16, 2019·4 cites·18 claims
- 0272US12002687B2System and methods for wafer dryingTOKYO ELECTRON LTD·Filed 2022·Granted Jun 4, 2024·0 cites·16 claims
- 0370US10886290B2Etching of silicon nitride and silica deposition control in 3D NAND structuresTOKYO ELECTRON LTD·Filed 2019·Granted Jan 5, 2021·1 cites·20 claims
- 0470US10515820B2Process and apparatus for processing a nitride structure without silica depositionTOKYO ELECTRON LTD·Filed 2017·Granted Dec 24, 2019·1 cites·20 claims
- 0562US11515178B2System and methods for wafer dryingTOKYO ELECTRON LTD·Filed 2020·Granted Nov 29, 2022·0 cites·18 claims
- 0659US2025085053A1Flow stability control in drying liquid between platesTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0757US2025379045A1Wafer cleaning method and systemTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0855US10916440B2Process and apparatus for processing a nitride structure without silica depositionTOKYO ELECTRON LTD·Filed 2019·Granted Feb 9, 2021·0 cites·13 claims
- 0954US2025364335A1Systems and methods for wafer processing with sensor technologiesTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1051US2024404794A1Plasma processing method and apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1147US11376640B2Apparatus and method to electrostatically remove foreign matter from substrate surfacesTOKYO ELECTRON LTD·Filed 2019·Granted Jul 5, 2022·0 cites·20 claims
- 1245US10062586B2Chemical fluid processing apparatus and chemical fluid processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Aug 28, 2018·0 cites·13 claims
- 1345US2021384049A1System and Method for Wet Chemical Etching in Semiconductor ProcessingTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1442US10256163B2Method of treating a microelectronic substrate using dilute TMAHTOKYO ELECTRON LTD·Filed 2016·Granted Apr 9, 2019·0 cites·29 claims
- 1541US2019348305A1Rapid Wafer Drying Using Induction HeatingTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
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