Inventor · disambiguated record
Wallace P. Printz
Also filed as: PRINTZ WALLACE · PRINTZ WALLACE P · PRINTZ WALLACE PAUL
19 granted patents·8 pending applications·61 citations·filing 2008–2020
91Inventor score
Top patents by PatentIndex Score
27 records- 0196US7829269B1Dual tone development with plural photo-acid generators in lithographic applicationsTOKYO ELECTRON LTD·Filed 2009·Granted Nov 9, 2010·32 cites·13 claims
- 0287US10325779B2Colloidal silica growth inhibitor and associated method and systemTOKYO ELECTRON LTD·Filed 2017·Granted Jun 18, 2019·4 cites·19 claims
- 0386US9735026B2Controlling cleaning of a layer on a substrate using nozzlesTOKYO ELECTRON LTD·Filed 2013·Granted Aug 15, 2017·7 cites·20 claims
- 0485US10429745B2Photo-sensitized chemically amplified resist (PS-CAR) simulationTOKYO ELECTRON LTD·Filed 2016·Granted Oct 1, 2019·3 cites·24 claims
- 0582US10048587B2Method and apparatus for increased recirculation and filtration in a photoresist dispense system using a liquid empty reservoirTOKYO ELECTRON LTD·Filed 2015·Granted Aug 14, 2018·3 cites·6 claims
- 0677US10262880B2Cover plate for wind mark control in spin coating processTOKYO ELECTRON LTD·Filed 2013·Granted Apr 16, 2019·4 cites·18 claims
- 0773US9513556B2Method and system of process chemical temperature control using an injection nozzleTOKYO ELECTRON LTD·Filed 2013·Granted Dec 6, 2016·2 cites·20 claims
- 0870US10515820B2Process and apparatus for processing a nitride structure without silica depositionTOKYO ELECTRON LTD·Filed 2017·Granted Dec 24, 2019·1 cites·20 claims
- 0969US9852920B2Etch system and method for single substrate processingTOKYO ELECTRON LTD·Filed 2016·Granted Dec 26, 2017·1 cites·20 claims
- 1069US9257292B2Etch system and method for single substrate processingBROWN IAN J·Filed 2011·Granted Feb 9, 2016·2 cites·30 claims
- 1167US8574810B2Dual tone development with a photo-activated acid enhancement component in lithographic applicationsFONSECA CARLOS A·Filed 2009·Granted Nov 5, 2013·2 cites·20 claims
- 1259US2020348596A1Method and apparatus for multiple recirculation and filtration cycles per dispense in a photoresist dispense systemTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1358US10763120B2Colloidal silica growth inhibitor and associated method and systemTOKYO ELECTRON LTD·Filed 2019·Granted Sep 1, 2020·0 cites·12 claims
- 1455US10916440B2Process and apparatus for processing a nitride structure without silica depositionTOKYO ELECTRON LTD·Filed 2019·Granted Feb 9, 2021·0 cites·13 claims
- 1555US8568964B2Flood exposure process for dual tone development in lithographic applicationsFONSECA CARLOS A·Filed 2009·Granted Oct 29, 2013·0 cites·14 claims
- 1647US2010154826A1System and Method For Rinse OptimizationTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1745US10062586B2Chemical fluid processing apparatus and chemical fluid processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Aug 28, 2018·0 cites·13 claims
- 1844US10490399B2Systems and methodologies for vapor phase hydroxyl radical processing of substratesTOKYO ELECTRON LTD·Filed 2017·Granted Nov 26, 2019·0 cites·15 claims
- 1943US10096480B2Method and apparatus for dynamic control of the temperature of a wet etch processTOKYO ELECTRON LTD·Filed 2016·Granted Oct 9, 2018·0 cites·22 claims
- 2042US10256163B2Method of treating a microelectronic substrate using dilute TMAHTOKYO ELECTRON LTD·Filed 2016·Granted Apr 9, 2019·0 cites·29 claims
- 2138US9075318B2Sequential stage mixing for a resist batch strip processBROWN IAN J·Filed 2012·Granted Jul 7, 2015·0 cites·25 claims
- 2236US2017092484A1Method and apparatus for drying semiconductor substrates using liquid carbon dioxideTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 2336US2016358786A1Techniques for Spin-on-Carbon PlanarizationTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 2436US2012045721A1Method for forming a self-aligned double patternPRINTZ WALLACE P·Filed 2010·Application pending·0 cites
- 2536US2012248061A1Increasing masking layer etch rate and selectivityBROWN IAN J·Filed 2011·Application pending·0 cites
- 2636US2012045722A1Technique to form a self-aligned double patternPRINTZ WALLACE P·Filed 2010·Application pending·0 cites
- 2733US2015325458A1Method and system to improve drying of flexible nano-structuresTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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