Inventor · disambiguated record
Benjamin Bayer
Also filed as: BAYER BENJAMIN · BAYER BENJAMIN P · BAYER BENJAMIN PATRICK
11 granted patents·3 pending applications·119 citations·filing 2002–2017
91Inventor score
Files withCABOT MICROELECTRONICS CORP8VERSUM MAT US LLC2AIR PROD & CHEM1CABOT MIRCROELECTRONICS CORP1DAIMLER CHRYSLER AG1
Top patents by PatentIndex Score
14 records- 0189US8101093B2Chemical-mechanical polishing composition and method for using the sameDE REGE THESAURO FRANCESCO·Filed 2009·Granted Jan 24, 2012·10 cites·18 claims
- 0286US9770804B2Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufactureAIR PROD & CHEM·Filed 2014·Granted Sep 26, 2017·14 cites·22 claims
- 0380US7294576B1Tunable selectivity slurries in CMP applicationsCABOT MICROELECTRONICS CORP·Filed 2006·Granted Nov 13, 2007·9 cites·13 claims
- 0478US10562151B2Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufactureVERSUM MAT US LLC·Filed 2017·Granted Feb 18, 2020·4 cites·30 claims
- 0576US11266959B2Low pressure fluctuation apparatuses for blending fluids, and methods of using the sameVERSUM MAT US LLC·Filed 2015·Granted Mar 8, 2022·4 cites·41 claims
- 0676US7161247B2Polishing composition for noble metalsCABOT MICROELECTRONICS CORP·Filed 2004·Granted Jan 9, 2007·18 cites·26 claims
- 0775US7097541B2CMP method for noble metalsCABOT MICROELECTRONICS CORP·Filed 2003·Granted Aug 29, 2006·23 cites·15 claims
- 0868US7160807B2CMP of noble metalsCABOT MICROELECTRONICS CORP·Filed 2003·Granted Jan 9, 2007·12 cites·32 claims
- 0964US7563383B2CMP composition with a polymer additive for polishing noble metalsCABOT MIRCROELECTRONICS CORP·Filed 2004·Granted Jul 21, 2009·12 cites·18 claims
- 1056US7288021B2Chemical-mechanical polishing of metals in an oxidized formCABOT MICROELECTRONICS CORP·Filed 2004·Granted Oct 30, 2007·7 cites·30 claims
- 1151US2005211950A1Chemical-mechanical polishing composition and method for using the sameCABOT MICROELECTRONICS CORP·Filed 2004·Application pending·0 cites
- 1250US6763746B2Adjusting device and associated actuating toolDAIMLER CHRYSLER AG·Filed 2002·Granted Jul 20, 2004·6 cites·18 claims
- 1341US2008220610A1Silicon oxide polishing method utilizing colloidal silicaCABOT MICROELECTRONICS CORP·Filed 2006·Application pending·0 cites
- 1441US2008020680A1Rate-enhanced CMP compositions for dielectric filmsCABOT MICROELECTRONICS CORP·Filed 2006·Application pending·0 cites
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