Inventor · disambiguated record
Yuji Kamikawa
Also filed as: KAMIKAWA YUJI
86 granted patents·6 pending applications·2,062 citations·filing 1991–2014
99Inventor score
Top patents by PatentIndex Score
92 records- 0195US8851819B2Substrate processing apparatusKAMIKAWA YUJI·Filed 2010·Granted Oct 7, 2014·29 cites·3 claims
- 0294US6299696B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Oct 9, 2001·69 cites·5 claims
- 0393US6247479B1Washing/drying process apparatus and washing/drying process methodTOKYO ELECTRON LTD·Filed 1998·Granted Jun 19, 2001·165 cites·14 claims
- 0492US8002511B2Batch forming apparatus, substrate processing system, batch forming method, and storage mediumTOKYO ELECTRON LTD·Filed 2006·Granted Aug 23, 2011·21 cites·29 claims
- 0592US6575178B1Cleaning and drying method and apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jun 10, 2003·53 cites·12 claims
- 0692US6164297ACleaning and drying apparatus for objects to be processedTOKYO ELECTRON LTD·Filed 1998·Granted Dec 26, 2000·123 cites·30 claims
- 0792US5940985AApparatus and method for drying substratesTOKYO ELECTRON LTD·Filed 1997·Granted Aug 24, 1999·129 cites·27 claims
- 0891US7593625B2Fluid heating apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Sep 22, 2009·25 cites·9 claims
- 0990US6029371ADrying treatment method and apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Feb 29, 2000·107 cites·11 claims
- 1089US6589359B2Cleaning method and cleaning apparatus for substrateTOKYO ELECTRON LTD·Filed 2001·Granted Jul 8, 2003·43 cites·6 claims
- 1189US6342104B1Method of cleaning objects to be processedTOKYO ELECTRON LTD·Filed 2000·Granted Jan 29, 2002·37 cites·13 claims
- 1288US6861371B2Substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2002·Granted Mar 1, 2005·48 cites·22 claims
- 1388US6613692B1Substrate processing method and apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Sep 2, 2003·35 cites·13 claims
- 1487US6241827B1Method for cleaning a workpieceTOKYO ELECTRON LTD·Filed 1999·Granted Jun 5, 2001·41 cites·12 claims
- 1586US6394110B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2001·Granted May 28, 2002·30 cites·17 claims
- 1684US6009890ASubstrate transporting and processing systemTOKYO ELECTRON LTD·Filed 1998·Granted Jan 4, 2000·75 cites·26 claims
- 1783US8944078B2Substrate processing apparatus, substrate processing method and storage mediumKAMIKAWA YUJI·Filed 2011·Granted Feb 3, 2015·6 cites·2 claims
- 1883US8268087B2Liquid processing apparatus, liquid processing method, and storage mediumKAMIKAWA YUJI·Filed 2008·Granted Sep 18, 2012·8 cites·13 claims
- 1983US6746543B2Apparatus for and method of cleaning objects to be processedTOKYO ELECTRON LTD·Filed 2001·Granted Jun 8, 2004·23 cites·7 claims
- 2083US6050275AApparatus for and method of cleaning objects to be processedTOKYO ELECTRON LTD·Filed 1997·Granted Apr 18, 2000·53 cites·19 claims
- 2182US7637029B2Vapor drying method, apparatus and recording medium for use in the methodTOKYO ELECTRON LTD·Filed 2006·Granted Dec 29, 2009·11 cites·2 claims
- 2282US6536452B1Processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Mar 25, 2003·28 cites·30 claims
- 2381US6532975B1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Mar 18, 2003·25 cites·20 claims
- 2481US6357458B2Cleaning apparatus and cleaning methodTOKYO ELECTRON LTD·Filed 2001·Granted Mar 19, 2002·15 cites·10 claims
- 2581US6171403B1Cleaning and drying apparatus, wafer processing system and wafer processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Jan 9, 2001·24 cites·9 claims
- 2680US6510859B1Apparatus and method for cleaning and drying objectTOKYO ELECTRON LTD·Filed 2000·Granted Jan 28, 2003·24 cites·14 claims
- 2779US6131588AApparatus for and method of cleaning object to be processedTOKYO ELECTRON LTD·Filed 1998·Granted Oct 17, 2000·45 cites·39 claims
- 2879US6119367ASystem for drying semiconductor wafers using ultrasonic or low frequency vibrationTOKYO ELECTRON LTD·Filed 1999·Granted Sep 19, 2000·54 cites·23 claims
- 2978US10700166B2Nozzle cleaning device, nozzle cleaning method, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jun 30, 2020·4 cites·10 claims
- 3078US6068002ACleaning and drying apparatus, wafer processing system and wafer processing methodTOKYO ELECTRON LTD·Filed 1998·Granted May 30, 2000·46 cites·15 claims
- 3177US6776173B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Aug 17, 2004·17 cites·20 claims
- 3277US6491045B2Apparatus for and method of cleaning object to be processedTOKYO ELECTRON LTD·Filed 2001·Granted Dec 10, 2002·15 cites·9 claims
- 3377US6158449ACleaning and drying method and apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Dec 12, 2000·43 cites·15 claims
- 3476US6698439B2Processing apparatus with sealing mechanismTOKYO ELECTRON LTD·Filed 2001·Granted Mar 2, 2004·19 cites·24 claims
- 3576US6158447ACleaning method and cleaning equipmentTOKYO ELECTRON LTD·Filed 1998·Granted Dec 12, 2000·44 cites·16 claims
- 3676US5488964AWashing apparatus, and washing methodTOKYO ELECTRON LTD·Filed 1992·Granted Feb 6, 1996·45 cites·9 claims
- 3775US8152928B2Substrate cleaning method, substrate cleaning system and program storage mediumWATANABE TSUKASA·Filed 2007·Granted Apr 10, 2012·5 cites·8 claims
- 3875US6647642B2Liquid processing apparatus and methodTOKYO ELECTRON LTD·Filed 2001·Granted Nov 18, 2003·26 cites·17 claims
- 3974US8567089B2Evaporator, evaporation method and substrate processing apparatusNAKASHIMA MIKIO·Filed 2012·Granted Oct 29, 2013·2 cites·12 claims
- 4074US8281498B2Evaporator, evaporation method and substrate processing apparatusNAKASHIMA MIKIO·Filed 2009·Granted Oct 9, 2012·3 cites·11 claims
- 4173US6495215B1Method and apparatus for processing substrateTOKYO ELECTRON LTD·Filed 2000·Granted Dec 17, 2002·15 cites·19 claims
- 4273US6318386B1Treatment apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Nov 20, 2001·14 cites·4 claims
- 4373US5922138ALiquid treatment method and apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Jul 13, 1999·36 cites·17 claims
- 4472US8371318B2Liquid processing apparatus, liquid processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2012·Granted Feb 12, 2013·2 cites·3 claims
- 4572US7412981B2Liquid processing apparatus and methodTOKYO ELECTRON LTD·Filed 2006·Granted Aug 19, 2008·3 cites·10 claims
- 4672US6792958B2System for processing substrate with liquidTOKYO ELECTRON LTD·Filed 2001·Granted Sep 21, 2004·14 cites·12 claims
- 4771US8303724B2Substrate processing method and non-transitory storage medium for carrying out such methodHIROSHIRO KOUKICHI·Filed 2011·Granted Nov 6, 2012·2 cites·10 claims
- 4871US6592678B1Cleaning method and cleaning equipmentTOKYO ELECTRON LTD·Filed 2000·Granted Jul 15, 2003·12 cites·4 claims
- 4971US6435199B1Treatment apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Aug 20, 2002·13 cites·19 claims
- 5070US6109278ALiquid treatment method and apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Aug 29, 2000·32 cites·23 claims
Showing the top 50 of 92 patent records by PatentIndex Score.
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