Inventor · disambiguated record
Hong Sheng Yang
Also filed as: YANG HONG · Yang hong sheng
17 granted patents·17 pending applications·45 citations·filing 2011–2025
90Inventor score
Files withINTERMOLECULAR INC12Yang hong sheng8INST OF MICROELECTRONICS CAS5ARRAYED MAT CHINA CO LTD2PHAM HIEU2
Top patents by PatentIndex Score
34 records- 0195US8569104B2Transition metal oxide bilayersPHAM HIEU·Filed 2012·Granted Oct 29, 2013·27 cites·18 claims
- 0292US8735217B2Multifunctional electrodeINTERMOLECULAR INC·Filed 2013·Granted May 27, 2014·4 cites·20 claims
- 0385US9373622B2CMOS device with improved accuracy of threshold voltage adjustment and method for manufacturing the sameINST OF MICROELECTRONICS CAS·Filed 2015·Granted Jun 21, 2016·5 cites·9 claims
- 0484US8906736B1Multifunctional electrodeINTERMOLECULAR INC·Filed 2014·Granted Dec 9, 2014·1 cites·20 claims
- 0582US8974649B2Combinatorial RF bias method for PVDSHAO SHOUQIAN·Filed 2011·Granted Mar 10, 2015·3 cites·17 claims
- 0680US8779407B2Multifunctional electrodePHAM HIEU·Filed 2012·Granted Jul 15, 2014·1 cites·19 claims
- 0778US8906207B2Control of film composition in co-sputter deposition by using collimatorsYang hong sheng·Filed 2011·Granted Dec 9, 2014·2 cites·18 claims
- 0873US10340497B2Secondary batteryNINGDE AMPEREX TECHNOLOGY LTD·Filed 2017·Granted Jul 2, 2019·1 cites·7 claims
- 0973US8859328B2Multifunctional electrodeINTERMOLECULAR INC·Filed 2014·Granted Oct 14, 2014·0 cites·20 claims
- 1067US2025305114A1Magnetron Sputtering Apparatus and Control Method for Timely Detecting Target Shorting by Monitoring Electrical Resistance Between PVD Target Cathode and Electrical Ground in Real TimeARRAYED MAT CHINA CO LTD·Filed 2025·Application pending·0 cites
- 1161US8704203B2Transition metal oxide bilayersINTERMOLECULAR INC·Filed 2013·Granted Apr 22, 2014·0 cites·20 claims
- 1256US10863866B2Detachable juicerSHENZHEN NINGRUI ELECTRONIC TECH CO LTD·Filed 2018·Granted Dec 15, 2020·1 cites·7 claims
- 1356US8987697B2Transition metal oxide bilayersINTERMOLECULAR INC·Filed 2014·Granted Mar 24, 2015·0 cites·9 claims
- 1454US9087978B1Transition metal oxide bilayersINTERMOLECULAR INC·Filed 2015·Granted Jul 21, 2015·0 cites·20 claims
- 1553US2014262749A1Methods of Plasma Surface Treatment in a PVD ChamberINTERMOLECULAR INC·Filed 2013·Application pending·0 cites
- 1652US2014174907A1High Deposition Rate Chamber with Co-Sputtering CapabilitiesINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 1751US2014174918A1Sputter GunINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 1848US8920618B2Combinatorial processing using high deposition rate sputteringYang hong sheng·Filed 2011·Granted Dec 30, 2014·0 cites·15 claims
- 1948US2025198514A1O-Ring Vacuum Sealing Structure and Vacuum ApparatusARRAYED MAT CHINA CO LTD·Filed 2022·Application pending·0 cites
- 2046US9934975B2N-type MOSFET and method for manufacturing the sameINST OF MICROELECTRONICS CAS·Filed 2014·Granted Apr 3, 2018·0 cites·18 claims
- 2146US2013270104A1Combinatorial processing using mosaic sputtering targetsYang hong sheng·Filed 2012·Application pending·0 cites
- 2246US2013168231A1Method For Sputter Deposition And RF Plasma Sputter Etch Combinatorial ProcessingYang hong sheng·Filed 2011·Application pending·0 cites
- 2343US2014174921A1Multi-Piece Target and Magnetron to Prevent Sputtering of Target Backing MaterialsINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 2443US2012285819A1Combinatorial and Full Substrate Sputter Deposition Tool and MethodCHILD KENT RILEY·Filed 2011·Application pending·0 cites
- 2542US2014144771A1Cooling Efficiency Method for Fluid Cooled Sputter GunsINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 2641US10056261B2P type MOSFETINST OF MICROELECTRONICS CAS·Filed 2012·Granted Aug 21, 2018·0 cites·4 claims
- 2741US9175382B2High metal ionization sputter gunYang hong sheng·Filed 2011·Granted Nov 3, 2015·0 cites·12 claims
- 2839US2013017316A1Sputter gunINTERMOLECULAR INC·Filed 2011·Application pending·0 cites
- 2939US2015048458A1Semiconductor device and manufacturing method thereofINST OF MICROELECTRONICS CAS·Filed 2012·Application pending·0 cites
- 3039US2013146442A1Profiled sputter targetYang hong sheng·Filed 2011·Application pending·0 cites
- 3138US2013101749A1Method and Apparatus for Enhanced Film UniformityYang hong sheng·Filed 2011·Application pending·0 cites
- 3237US2013153413A1Sputter gun shutterYang hong sheng·Filed 2011·Application pending·0 cites
- 3335US2013153149A1Substrate Processing Tool with Tunable Fluid FlowWANG DANNY·Filed 2011·Application pending·0 cites
- 3432US2015255557A1Semiconductor device and method for manufacturing the sameINST OF MICROELECTRONICS CAS·Filed 2015·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →