Inventor · disambiguated record
Hirokazu Nishimaki
Also filed as: NISHIMAKI HIROKAZU
25 granted patents·16 pending applications·39 citations·filing 2010–2022
92Inventor score
Files withNISSAN CHEMICAL CORP20NISSAN CHEMICAL IND LTD15KISHIOKA TAKAHIRO2HORIGUCHI YUSUKE1KIMURA SHIGEO1
Top patents by PatentIndex Score
41 records- 0190US8993215B2Resist underlayer film forming composition containing phenylindole-containing novolac resinNISSAN CHEMICAL IND LTD·Filed 2013·Granted Mar 31, 2015·11 cites·8 claims
- 0287US9263286B2Diarylamine novolac resinNISSAN CHEMICAL IND LTD·Filed 2012·Granted Feb 16, 2016·8 cites·13 claims
- 0380US9469777B2Resist underlayer film forming composition that contains novolac resin having polynuclear phenolNISSAN CHEMICAL IND LTD·Filed 2013·Granted Oct 18, 2016·4 cites·12 claims
- 0478US9261790B2Resist underlayer film-forming composition containing copolymer resin having heterocyclic ringNISSAN CHEMICAL IND LTD·Filed 2013·Granted Feb 16, 2016·4 cites·15 claims
- 0575US11650505B2Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compoundNISSAN CHEMICAL IND LTD·Filed 2015·Granted May 16, 2023·2 cites·15 claims
- 0675US9244353B2Resist underlayer film forming compositionNISSAN CHEMICAL IND LTD·Filed 2013·Granted Jan 26, 2016·3 cites·5 claims
- 0772US9023583B2Monolayer or multilayer forming compositionKISHIOKA TAKAHIRO·Filed 2011·Granted May 5, 2015·2 cites·7 claims
- 0870US8685615B2Photosensitive resist underlayer film forming compositionKIMURA SHIGEO·Filed 2010·Granted Apr 1, 2014·2 cites·12 claims
- 0966US10191374B2Resist underlayer film-forming compositionNISSAN CHEMICAL IND LTD·Filed 2015·Granted Jan 29, 2019·1 cites·11 claims
- 1065US11199777B2Resist underlayer film-forming composition containing novolac polymer having secondary amino groupNISSAN CHEMICAL IND LTD·Filed 2014·Granted Dec 14, 2021·1 cites·10 claims
- 1163US9436085B2Composition for forming photosensitive resist underlayer filmHORIGUCHI YUSUKE·Filed 2010·Granted Sep 6, 2016·1 cites·2 claims
- 1262US12405533B2Resist underlayer film-forming composition containing substituted crosslinkable compoundNISSAN CHEMICAL IND LTD·Filed 2020·Granted Sep 2, 2025·0 cites·2 claims
- 1360US2025004367A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 1455US10809619B2Resist underlayer film-forming composition containing substituted crosslinkable compoundNISSAN CHEMICAL IND LTD·Filed 2014·Granted Oct 20, 2020·0 cites·12 claims
- 1555US2024427238A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 1654US12044969B2Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2020·Granted Jul 23, 2024·0 cites·11 claims
- 1753US12025916B2Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is addedNISSAN CHEMICAL CORP·Filed 2019·Granted Jul 2, 2024·0 cites·13 claims
- 1853US10017664B2Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehydeNISSAN CHEMICAL IND LTD·Filed 2014·Granted Jul 10, 2018·0 cites·12 claims
- 1951US2023333474A1Resist underlayer film-forming composition comprising fluoroalkyl group-containing organic acid or salt thereofNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 2051US2024004296A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 2149US9140989B2Photosensitive organic particlesKISHIOKA TAKAHIRO·Filed 2012·Granted Sep 22, 2015·0 cites·12 claims
- 2249US2023259031A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 2349US2023359123A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 2447US8822138B2Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ringSHINJO TETSUYA·Filed 2010·Granted Sep 2, 2014·0 cites·13 claims
- 2547US2022334483A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2020·Application pending·0 cites
- 2646US9395628B2Resist underlayer film-forming composition containing aryl sulfonate salt having hydroxyl groupNISSAN CHEMICAL IND LTD·Filed 2014·Granted Jul 19, 2016·0 cites·11 claims
- 2745US2024201592A1Composition for forming resist underlayer filmNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 2844US12313972B2Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2020·Granted May 27, 2025·0 cites·9 claims
- 2944US2024103369A1Resist underlayer film formation compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 3044US2023137360A1Composition for forming resist underlayer filmNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 3144US2016147151A1Resist underlayer film-forming composition contaning pyrrole novolac resinNISSAN CHEMICAL IND LTD·Filed 2014·Application pending·0 cites
- 3244US2021271169A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2019·Application pending·0 cites
- 3344US2022269176A1Composition for coating substrate with level difference, said composition containing compound having curable functional groupNISSAN CHEMICAL CORP·Filed 2020·Application pending·0 cites
- 3443US11472168B2Laminated body including novolac resin as peeling layerNISSAN CHEMICAL CORP·Filed 2018·Granted Oct 18, 2022·0 cites·17 claims
- 3543US10585353B2Resist underlayer film forming compositionNISSAN CHEMICAL CORP·Filed 2017·Granted Mar 10, 2020·0 cites·6 claims
- 3641US10394124B2Resist underlayer film-forming composition containing polymer having arylene groupNISSAN CHEMICAL IND LTD·Filed 2015·Granted Aug 27, 2019·0 cites·6 claims
- 3741US2022229368A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2020·Application pending·0 cites
- 3840US11287742B2Composition for forming resist underlayer film having improved flattening propertiesNISSAN CHEMICAL CORP·Filed 2018·Granted Mar 29, 2022·0 cites·11 claims
- 3937US2019079397A1Stepped substrate coating composition including compound having photocrosslinking group due to unsaturated bond between carbon atomsNISSAN CHEMICAL CORP·Filed 2017·Application pending·0 cites
- 4036US12072629B2Resist underlayer film-forming composition containing novolac resin to which aromatic vinyl compound is addedNISSAN CHEMICAL IND LTD·Filed 2015·Granted Aug 27, 2024·0 cites·12 claims
- 4129US2012288795A1Composition for formation of photosensitive resist underlayer film and method for formation of resist patternUMEZAKI MAKIKO·Filed 2010·Application pending·0 cites
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