Inventor · disambiguated record
Richard A. Gottscho
Also filed as: GOTTSCHO RICHARD · GOTTSCHO RICHARD A · GOTTSCHO RICHARD ALAN
56 granted patents·11 pending applications·1,987 citations·filing 1988–2025
99Inventor score
Top patents by PatentIndex Score
67 records- 0198US12278125B2Integrated dry processes for patterning radiation photoresist patterningLAM RES CORP·Filed 2023·Granted Apr 15, 2025·8 cites·19 claims
- 0298US12183604B2Integrated dry processes for patterning radiation photoresist patterningLAM RES CORP·Filed 2023·Granted Dec 31, 2024·9 cites·37 claims
- 0398US11209729B2Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2019·Granted Dec 28, 2021·21 cites·14 claims
- 0498US10831096B2Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2018·Granted Nov 10, 2020·34 cites·18 claims
- 0598US10514598B2Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2017·Granted Dec 24, 2019·33 cites·10 claims
- 0698US10041868B2Estimation of lifetime remaining for a consumable-part in a semiconductor manufacturing chamberLAM RES CORP·Filed 2015·Granted Aug 7, 2018·21 cites·20 claims
- 0798US9778561B2Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2015·Granted Oct 3, 2017·380 cites·9 claims
- 0898US9449793B2Systems, methods and apparatus for choked flow element extractionSHAJII ALI·Filed 2010·Granted Sep 20, 2016·469 cites·16 claims
- 0997US12105422B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2020·Granted Oct 1, 2024·13 cites·12 claims
- 1097US10197908B2Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling frameworkLAM RES CORP·Filed 2016·Granted Feb 5, 2019·27 cites·32 claims
- 1197US9972478B2Method and process of implementing machine learning in complex multivariate wafer processing equipmentLAM RES CORP·Filed 2016·Granted May 15, 2018·23 cites·14 claims
- 1297US9966231B2Direct current pulsing plasma systemsLAM RES CORP·Filed 2016·Granted May 8, 2018·25 cites·30 claims
- 1396US11276564B2Plasma processing system having an inspection tool and controller that interfaces with a tool modelLAM RES CORP·Filed 2019·Granted Mar 15, 2022·12 cites·17 claims
- 1496US9996647B2Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimizationLAM RES CORP·Filed 2017·Granted Jun 12, 2018·12 cites·31 claims
- 1596US9792393B2Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimizationLAM RES CORP·Filed 2016·Granted Oct 17, 2017·19 cites·34 claims
- 1696US8900402B2Semiconductor processing system having multiple decoupled plasma sourcesHOLLAND JOHN PATRICK·Filed 2011·Granted Dec 2, 2014·38 cites·20 claims
- 1795US12510825B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2024·Granted Dec 30, 2025·2 cites·33 claims
- 1895US12510826B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2024·Granted Dec 30, 2025·2 cites·12 claims
- 1995US10615009B2System implementing machine learning in complex multivariate wafer processing equipmentLAM RES CORP·Filed 2018·Granted Apr 7, 2020·10 cites·16 claims
- 2095US10269545B2Methods for monitoring plasma processing systems for advanced process and tool controlLAM RES CORP·Filed 2017·Granted Apr 23, 2019·10 cites·13 claims
- 2194US10585347B2Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling frameworkLAM RES CORP·Filed 2018·Granted Mar 10, 2020·9 cites·21 claims
- 2294US6921724B2Variable temperature processes for tunable electrostatic chuckLAM RES CORP·Filed 2002·Granted Jul 26, 2005·102 cites·26 claims
- 2394US6632322B1Switched uniformity controlLAM RES CORP·Filed 2000·Granted Oct 14, 2003·46 cites·30 claims
- 2493US11263737B2Defect classification and source analysis for semiconductor equipmentLAM RES CORP·Filed 2019·Granted Mar 1, 2022·10 cites·40 claims
- 2593US10303830B2Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimizationLAM RES CORP·Filed 2018·Granted May 28, 2019·9 cites·29 claims
- 2692US5847690AIntegrated liquid crystal display and digitizer having a black matrix layer adapted for sensing screen touch locationLUCENT TECHNOLOGIES INC·Filed 1995·Granted Dec 8, 1998·231 cites·13 claims
- 2791US6151532AMethod and apparatus for predicting plasma-process surface profilesLAM RES CORP·Filed 1998·Granted Nov 21, 2000·70 cites·28 claims
- 2891US2025053080A1Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2024·Application pending·0 cites
- 2990US10386828B2Methods and apparatuses for etch profile matching by surface kinetic model optimizationLAM RES CORP·Filed 2015·Granted Aug 20, 2019·8 cites·33 claims
- 3090US5124216AMethod for monitoring photoresist latent imagesAT & T BELL LAB·Filed 1990·Granted Jun 23, 1992·74 cites·7 claims
- 3188US8900403B2Semiconductor processing system having multiple decoupled plasma sourcesHOLLAND JOHN PATRICK·Filed 2011·Granted Dec 2, 2014·7 cites·19 claims
- 3284US2023273516A1Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2023·Application pending·0 cites
- 3384US2023266662A1Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2023·Application pending·0 cites
- 3481US4902631AMonitoring the fabrication of semiconductor devices by photon induced electron emissionAT & T BELL LAB·Filed 1988·Granted Feb 20, 1990·26 cites·12 claims
- 3580US6301510B1Method and apparatus to calibrate a semi-empirical process simulatorLAM RES CORP·Filed 2000·Granted Oct 9, 2001·10 cites·19 claims
- 3680US5002631APlasma etching apparatus and methodAT & T BELL LAB·Filed 1990·Granted Mar 26, 1991·80 cites·10 claims
- 3780US2025246460A1Integrated dry processes for patterning radiation photoresist patterningLAM RES CORP·Filed 2025·Application pending·0 cites
- 3879US11520953B2Predicting etch characteristics in thermal etching and atomic layer etchingLAM RES CORP·Filed 2018·Granted Dec 6, 2022·3 cites·27 claims
- 3979US2022075260A1Vacuum-integrated hardmask processes and apparatusLAM RES CORP·Filed 2021·Application pending·0 cites
- 4077US9111729B2Small plasma chamber systems and methodsGOTTSCHO RICHARD·Filed 2010·Granted Aug 18, 2015·4 cites·44 claims
- 4177US7152011B2Smart component-based management techniques in a substrate processing systemLAM RES CORP·Filed 2004·Granted Dec 19, 2006·9 cites·49 claims
- 4273USRE39534EMethod and apparatus to calibrate a semi-empirical process simulatorLAM RES CORP·Filed 2002·Granted Mar 27, 2007·6 cites·18 claims
- 4372US5114233AMethod for inspecting etched workpiecesAT & T BELL LAB·Filed 1990·Granted May 19, 1992·35 cites·5 claims
- 4471US2023045336A1Integrated dry processes for patterning radiation photoresist patterningLAM RES CORP·Filed 2021·Application pending·0 cites
- 4569US8999104B2Systems, methods and apparatus for separate plasma source controlSHAJII ALI·Filed 2010·Granted Apr 7, 2015·2 cites·16 claims
- 4667US9967965B2Distributed, concentric multi-zone plasma source systems, methods and apparatusLAM RES CORP·Filed 2012·Granted May 8, 2018·2 cites·18 claims
- 4763US10283325B2Distributed multi-zone plasma source systems, methods and apparatusSHAJII ALI·Filed 2012·Granted May 7, 2019·1 cites·16 claims
- 4863US2022270237A1Defect classification and source analysis for semiconductor equipmentLAM RES CORP·Filed 2022·Application pending·0 cites
- 4960US9947557B2Semiconductor processing system having multiple decoupled plasma sourcesLAM RES CORP·Filed 2014·Granted Apr 17, 2018·0 cites·20 claims
- 5060US7282454B2Switched uniformity controlLAM RES CORP·Filed 2003·Granted Oct 16, 2007·3 cites·10 claims
Showing the top 50 of 67 patent records by PatentIndex Score.
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