Inventor · disambiguated record
Sanjeev Kaushal
Also filed as: KAUSHAL SANJEEV
34 granted patents·3 pending applications·379 citations·filing 2002–2017
97Inventor score
Top patents by PatentIndex Score
37 records- 0197US8396582B2Method and apparatus for self-learning and self-improving a semiconductor manufacturing toolKAUSHAL SANJEEV·Filed 2010·Granted Mar 12, 2013·61 cites·21 claims
- 0292US8744607B2Method and apparatus for self-learning and self-improving a semiconductor manufacturing toolTOKYO ELECTRON LTD·Filed 2013·Granted Jun 3, 2014·12 cites·20 claims
- 0389US7452793B2Wafer curvature estimation, monitoring, and compensationTOKYO ELECTRON LTD·Filed 2005·Granted Nov 18, 2008·15 cites·24 claims
- 0488US7025280B2Adaptive real time control of a reticle/mask systemTOKYO ELECTRON LTD·Filed 2004·Granted Apr 11, 2006·41 cites·29 claims
- 0586US9396443B2System and method for learning and/or optimizing manufacturing processesTOKYO ELECTRON LTD·Filed 2013·Granted Jul 19, 2016·6 cites·20 claims
- 0686US8954184B2Tool performance by linking spectroscopic information with tool operational parameters and material measurement informationKAUSHAL SANJEEV·Filed 2011·Granted Feb 10, 2015·8 cites·19 claims
- 0786US8725667B2Method and system for detection of tool performance degradation and mismatchKAUSHAL SANJEEV·Filed 2009·Granted May 13, 2014·30 cites·50 claims
- 0886US8078552B2Autonomous adaptive system and method for improving semiconductor manufacturing qualityKAUSHAL SANJEEV·Filed 2008·Granted Dec 13, 2011·16 cites·30 claims
- 0986US8026113B2Method of monitoring a semiconductor processing system using a wireless sensor networkTOKYO ELECTRON LTD·Filed 2006·Granted Sep 27, 2011·17 cites·35 claims
- 1085US7838072B2Method and apparatus for monolayer deposition (MLD)TOKYO ELECTRON LTD·Filed 2005·Granted Nov 23, 2010·7 cites·38 claims
- 1185US7101816B2Methods for adaptive real time control of a thermal processing systemTOKYO ELECTRON LTD·Filed 2003·Granted Sep 5, 2006·33 cites·26 claims
- 1284US9424528B2Method and apparatus for self-learning and self-improving a semiconductor manufacturing toolTOKYO ELECTRON LTD·Filed 2014·Granted Aug 23, 2016·11 cites·20 claims
- 1383US7165011B1Built-in self test for a thermal processing systemTOKYO ELECTRON LTD·Filed 2005·Granted Jan 16, 2007·11 cites·49 claims
- 1482US8723869B2Biologically based chamber matchingKAUSHAL SANJEEV·Filed 2011·Granted May 13, 2014·8 cites·32 claims
- 1582US7342244B2Spintronic transistorTOKYO ELECTRON LTD·Filed 2006·Granted Mar 11, 2008·13 cites·19 claims
- 1681US9275335B2Autonomous biologically based learning toolKAUSHAL SANJEEV·Filed 2012·Granted Mar 1, 2016·11 cites·20 claims
- 1781US8190543B2Autonomous biologically based learning toolKAUSHAL SANJEEV·Filed 2008·Granted May 29, 2012·17 cites·13 claims
- 1880US7561269B2Optical measurement system with systematic error correctionTOKYO ELECTRON LTD·Filed 2007·Granted Jul 14, 2009·8 cites·30 claims
- 1976US10133265B2Method and apparatus for autonomous identification of particle contamination due to isolated process events and systematic trendsTOKYO ELECTRON LTD·Filed 2016·Granted Nov 20, 2018·2 cites·20 claims
- 2076US7340377B2Monitoring a single-wafer processing systemTOKYO ELECTRON LTD·Filed 2006·Granted Mar 4, 2008·2 cites·33 claims
- 2175US9746849B2Method and apparatus for autonomous tool parameter impact identification system for semiconductor manufacturingTOKYO ELECTRON LTD·Filed 2012·Granted Aug 29, 2017·3 cites·19 claims
- 2275US7459175B2Method for monolayer depositionTOKYO ELECTRON LTD·Filed 2005·Granted Dec 2, 2008·2 cites·34 claims
- 2373US7519885B2Monitoring a monolayer deposition (MLD) system using a built-in self test (BIST) tableTOKYO ELECTRON LTD·Filed 2006·Granted Apr 14, 2009·7 cites·49 claims
- 2473US7444572B2Built-in self test for a thermal processing systemTOKYO ELECTRON LTD·Filed 2005·Granted Oct 28, 2008·4 cites·29 claims
- 2573US7406644B2Monitoring a thermal processing systemTOKYO ELECTRON LTD·Filed 2006·Granted Jul 29, 2008·4 cites·25 claims
- 2671US7302363B2Monitoring a system during low-pressure processesTOKYO ELECTRON LTD·Filed 2006·Granted Nov 27, 2007·6 cites·55 claims
- 2770US7710565B2Method of correcting systematic error in a metrology systemTOKYO ELECTRON LTD·Filed 2007·Granted May 4, 2010·7 cites·25 claims
- 2869US9405289B2Method and apparatus for autonomous identification of particle contamination due to isolated process events and systematic trendsTOKYO ELECTRON LTD·Filed 2012·Granted Aug 2, 2016·2 cites·20 claims
- 2969US7526699B2Method for creating a built-in self test (BIST) table for monitoring a monolayer deposition (MLD) systemTOKYO ELECTRON LTD·Filed 2006·Granted Apr 28, 2009·5 cites·35 claims
- 3067US10228678B2Tool failure analysis using space-distorted similarityTOKYO ELECTRON LTD·Filed 2015·Granted Mar 12, 2019·1 cites·22 claims
- 3162US7737051B2Silicon germanium surface layer for high-k dielectric integrationTOKYO ELECTRON LTD·Filed 2004·Granted Jun 15, 2010·8 cites·21 claims
- 3260US10635993B2System and method for learning and/or optimizing manufacturing processesTOKYO ELECTRON LTD·Filed 2016·Granted Apr 28, 2020·0 cites·20 claims
- 3359US10571900B2Method and apparatus for autonomous tool parameter impact identification system for semiconductor manufacturingTOKYO ELECTRON LTD·Filed 2017·Granted Feb 25, 2020·0 cites·20 claims
- 3449US2014304196A1Biologically based chamber matchingTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 3547US2015332167A1System and method for modeling and/or analyzing manufacturing processesKAUSHAL SANJEEV·Filed 2014·Application pending·0 cites
- 3644US7141765B2Heat treating deviceTOKYO ELECTRON LTD·Filed 2002·Granted Nov 28, 2006·1 cites·11 claims
- 3738US2007221125A1Semiconductor processing system with wireless sensor network monitoring system incorporated therewithTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
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