Inventor · disambiguated record
Yukio Shibano
Also filed as: SHIBANO YUKIO
15 granted patents·1 pending application·114 citations·filing 2000–2014
91Inventor score
Top patents by PatentIndex Score
16 records- 0192US6413682B1Synthetic quartz glass substrate for photomask and making methodSHINETSU CHEMICAL CO·Filed 2000·Granted Jul 2, 2002·47 cites·19 claims
- 0284US6855908B2Glass substrate and leveling thereofSHINETSU CHEMICAL CO·Filed 2002·Granted Feb 15, 2005·23 cites·11 claims
- 0378US6869732B2Glass substrate for photomasks and preparation methodSHINETSU CHEMICAL CO·Filed 2002·Granted Mar 22, 2005·16 cites·20 claims
- 0473US7183210B2Method for preparing large-size substrateSHINETSU CHEMICAL CO·Filed 2005·Granted Feb 27, 2007·6 cites·7 claims
- 0572US7608542B2Large-size glass substrate for photomask and making method, computer-readable recording medium, and mother glass exposure methodSHINETSU CHEMICAL CO·Filed 2006·Granted Oct 27, 2009·4 cites·16 claims
- 0668US7745071B2Large-sized glass substrateSHINETSU CHEMICAL CO·Filed 2007·Granted Jun 29, 2010·2 cites·6 claims
- 0766US9919962B2Polishing agent for synthetic quartz glass substrateSHINETSU CHEMICAL CO·Filed 2014·Granted Mar 20, 2018·0 cites·11 claims
- 0866US8460061B2Method for producing large-size synthetic quartz glass substrateSHIBANO YUKIO·Filed 2010·Granted Jun 11, 2013·3 cites·7 claims
- 0965US7906256B2Recycling of large-size photomask substrateSHINETSU CHEMICAL CO·Filed 2007·Granted Mar 15, 2011·2 cites·7 claims
- 1062US6928837B2Silica glass substrates and their selectionSHINETSU CHEMICAL CO·Filed 2001·Granted Aug 16, 2005·6 cites·12 claims
- 1159US2010243950A1Polishing agent for synthetic quartz glass substrateHARADA DAIJITSU·Filed 2009·Application pending·0 cites
- 1258US7588481B2Wafer polishing method and polished waferSHINETSU CHEMICAL CO·Filed 2006·Granted Sep 15, 2009·1 cites·7 claims
- 1356US9316902B2Photomask-forming glass substrate and making methodSHINETSU CHEMICAL CO·Filed 2013·Granted Apr 19, 2016·0 cites·4 claims
- 1452US7191618B2Large-sized substrate and method of producing the sameSHINETSU CHEMICAL CO·Filed 2003·Granted Mar 20, 2007·2 cites·11 claims
- 1544US8551346B2Photomask-forming glass substrate and making methodHARADA DAIJITSU·Filed 2010·Granted Oct 8, 2013·0 cites·7 claims
- 1644US8012563B2Large-size substrateSHINETSU CHEMICAL CO·Filed 2004·Granted Sep 6, 2011·2 cites·10 claims
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