Inventor

HATTENDORF MICHAEL L

US87 patents

⚠️ This page may combine multiple inventors who share the name “HATTENDORF MICHAEL L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HATTENDORF MICHAEL L

INTEL CORP

Gate line plug structures for advanced integrated circuit structure fabrication

Replacement gate structures for advanced integrated circuit structure fabrication

Method for forming an integrated circuit

CMOS transistor junction regions formed by a CVD etching and deposition sequence

Gate cut and fin trim isolation for advanced integrated circuit structure fabrication

Gate cut and fin trim isolation for advanced integrated circuit structure fabrication

Confined epitaxial regions for semiconductor devices and methods of fabricating semiconductor devices having confined epitaxial regions

Contact over active gate structures for advanced integrated circuit structure fabrication

Replacement gate structures for advanced integrated circuit structure fabrication

Differentiated voltage threshold metal gate structures for advanced integrated circuit structure fabrication

Contact over active gate structures for advanced integrated circuit structure fabrication

Fin cut and fin trim isolation for advanced integrated circuit structure fabrication

Formation of strain-inducing films

Angled implantation for removal of thin film layers

CMOS transistor junction regions formed by a CVD etching and deposition sequence

Trench contact structures for advanced integrated circuit structure fabrication

Trench contact structures for advanced integrated circuit structure fabrication

Fin cut and fin trim isolation for advanced integrated circuit structure fabrication

Gate line plug structures for advanced integrated circuit structure fabrication

Trench contact structures for advanced integrated circuit structure fabrication

Fin cut and fin trim isolation for advanced integrated circuit structure fabrication

Fin trim isolation with single gate spacing for advanced integrated circuit structure fabrication

Confined epitaxial regions for semiconductor devices and methods of fabricating semiconductor devices having confined epitaxial regions

Transistor fabrication technique including sacrificial protective layer for source/drain at contact location

Trench isolation for advanced integrated circuit structure fabrication

Dual metal gate structures for advanced integrated circuit structure fabrication

Dual metal silicide structures for advanced integrated circuit structure fabrication

Replacement gate structures for advanced integrated circuit structure fabrication

Dual metal gate structures for advanced integrated circuit structure fabrication

Trench plug hardmask for advanced integrated circuit structure fabrication

Integrated circuits with selective gate electrode recess

Fin patterning for advanced integrated circuit structure fabrication

Plugs for interconnect lines for advanced integrated circuit structure fabrication

Fin end plug structures for advanced integrated circuit structure fabrication

Contact over active gate structures for advanced integrated circuit structure fabrication

Trench contact structures for advanced integrated circuit structure fabrication

Gate line plug structures for advanced integrated circuit structure fabrication

Trench contact structures for advanced integrated circuit structure fabrication

Fin cut and fin trim isolation for advanced integrated circuit structure fabrication

Confined epitaxial regions for semiconductor devices and methods of fabricating semiconductor devices having confined epitaxial regions

Gate cut and fin trim isolation for advanced integrated circuit structure fabrication

Confined epitaxial regions for semiconductor devices and methods of fabricating semiconductor devices having confined epitaxial regions

CMOS transistor junction regions formed by a CVD etching and deposition sequence

Strained NMOS transistor featuring deep carbon doped regions and raised donor doped source and drain

Dual metal gate structure having portions of metal gate layers in contact with a gate dielectric

Trench plug hardmask for advanced integrated circuit structure fabrication

Trench isolation for advanced integrated circuit structure fabrication

Dual metal silicide structures for advanced integrated circuit structure fabrication

Replacement gate structures for advanced integrated circuit structure fabrication

MUKHERJEE SRIJIT

Integrated circuits with selective gate electrode recess