Inventor · disambiguated record
Chunyi Wu
Also filed as: WU CHUNYI
25 granted patents·8 pending applications·156 citations·filing 2003–2021
94Inventor score
Top patents by PatentIndex Score
33 records- 0197US8241832B2Compositions and processes for photolithographyWANG DEYAN·Filed 2009·Granted Aug 14, 2012·25 cites·9 claims
- 0296US7128822B2Leveler compoundsSHIPLEY CO LLC·Filed 2003·Granted Oct 31, 2006·70 cites·13 claims
- 0392US7662981B2Leveler compoundsROHM & HAAS ELECT MAT·Filed 2009·Granted Feb 16, 2010·19 cites·4 claims
- 0491US7510639B2Leveler compoundsROHM & HAAS ELECT MAT·Filed 2005·Granted Mar 31, 2009·20 cites·5 claims
- 0586US9012128B2Photoresist and coated substrate comprising sameRohm and Hass Electronic Materials LLC·Filed 2013·Granted Apr 21, 2015·5 cites·7 claims
- 0685US8722825B2Surface active additive and photoresist composition comprising sameWANG DEYAN·Filed 2012·Granted May 13, 2014·4 cites·6 claims
- 0784US8883400B2Compositions and processes for photolithographyWANG DEYAN·Filed 2012·Granted Nov 11, 2014·2 cites·16 claims
- 0875US8927190B2Photoresist comprising nitrogen-containing compoundLIU CONG·Filed 2011·Granted Jan 6, 2015·1 cites·18 claims
- 0975US8603728B2Polymer composition and photoresist comprising the polymerPROKOPOWICZ GREGORY P·Filed 2012·Granted Dec 10, 2013·3 cites·7 claims
- 1074US9274427B2Compositions and processes for photolithographyROHM & HAAS ELECT MAT·Filed 2014·Granted Mar 1, 2016·2 cites·11 claims
- 1168US10133179B2Pattern treatment methodsROHM & HAAS ELECT MAT·Filed 2016·Granted Nov 20, 2018·1 cites·11 claims
- 1267US9122159B2Compositions and processes for photolithographyWANG DEYAN·Filed 2012·Granted Sep 1, 2015·1 cites·15 claims
- 1365US9436082B2Compositions comprising base-reactive component and processes for photolithographyWANG DEYAN·Filed 2011·Granted Sep 6, 2016·1 cites·9 claims
- 1465US9005880B2Compositions comprising sulfonamide material and processes for photolithographyWANG DEYAN·Filed 2009·Granted Apr 14, 2015·1 cites·12 claims
- 1564US8748080B2Compositions and processes for photolithographyWANG DEYAN·Filed 2009·Granted Jun 10, 2014·1 cites·10 claims
- 1657US12234369B2Photoresist topcoat compositions and methods of processing photoresist compositionsROHM & HAAS ELECT MAT·Filed 2018·Granted Feb 25, 2025·0 cites·17 claims
- 1757US8808967B2Compositions and processes for photolithographyWANG DEYAN·Filed 2012·Granted Aug 19, 2014·0 cites·15 claims
- 1855US10719014B2Photoresists comprising amide componentROHM & HAAS ELECT MAT·Filed 2013·Granted Jul 21, 2020·0 cites·18 claims
- 1955US9475763B2Photoresist comprising nitrogen-containing compoundROHM & HAAS ELECT MAT·Filed 2015·Granted Oct 25, 2016·0 cites·22 claims
- 2054US10558122B2Compositions comprising sulfonamide material and processes for photolithographyROHM & HAAS ELECT MAT·Filed 2015·Granted Feb 11, 2020·0 cites·12 claims
- 2151US11809077B2Photoresist compositions and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2021·Granted Nov 7, 2023·0 cites·11 claims
- 2251US9507260B2Compositions and processes for photolithographyWANG DEYAN·Filed 2009·Granted Nov 29, 2016·0 cites·2 claims
- 2350US10527934B2Photoresists comprising ionic compoundROHM & HAAS ELECT MAT·Filed 2012·Granted Jan 7, 2020·0 cites·9 claims
- 2449US11940731B2Photoresist topcoat compositions and methods of processing photoresist compositionsROHM & HAAS ELECT MAT·Filed 2019·Granted Mar 26, 2024·0 cites·16 claims
- 2548US11846885B2Topcoat compositions and photolithographic methodsROHM & HAAS ELECT MAT·Filed 2014·Granted Dec 19, 2023·0 cites·4 claims
- 2648US2007012576A1Plating methodROHM & HAAS ELECT MAT·Filed 2005·Application pending·0 cites
- 2748US2021200084A1Polymers and photoresist compositionsROHM & HAAS ELECT MAT·Filed 2019·Application pending·0 cites
- 2844US2019204741A1Photoresist topcoat compositions and methods of processing photoresist compositionsROHM & HAAS ELECT MAT·Filed 2018·Application pending·0 cites
- 2942US2014120469A1Thermal acid generators for use in photoresistROHM & HAAS ELECT MAT·Filed 2012·Application pending·0 cites
- 3039US2013244178A1Photoresists comprising multi-amide componentPROKOPOWICZ GREGORY P·Filed 2012·Application pending·0 cites
- 3138US2012156595A1Compositions comprising sugar component and processes for photolithographyOH JOON-SEOK·Filed 2011·Application pending·0 cites
- 3238US2004217009A1Electroplating bathSHIPLEY CO LLC·Filed 2003·Application pending·0 cites
- 3337US2012077120A1Photoresists comprising multi-amide componentPROKOPOWICZ GREGORY P·Filed 2011·Application pending·0 cites
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