Inventor · disambiguated record
Kikuo Yamabe
Also filed as: YAMABE KIKUO
21 granted patents·983 citations·filing 1986–2009
97Inventor score
Top patents by PatentIndex Score
21 records- 0191US5237188ASemiconductor device with nitrided gate insulating filmTOSHIBA KK·Filed 1991·Granted Aug 17, 1993·83 cites·11 claims
- 0290US5189503AHigh dielectric capacitor having low current leakageTOSHIBA KK·Filed 1991·Granted Feb 23, 1993·128 cites·12 claims
- 0389US5502010AMethod for heat treating a semiconductor substrate to reduce defectsTOSHIBA KK·Filed 1993·Granted Mar 26, 1996·122 cites·5 claims
- 0489US5489542AMethod for fabricating semiconductor device in which threshold voltage shift and charge-pumping current are improvedTOSHIBA KK·Filed 1993·Granted Feb 6, 1996·71 cites·34 claims
- 0586US5259883AMethod of thermally processing semiconductor wafers and an apparatus thereforTOSHIBA KK·Filed 1993·Granted Nov 9, 1993·95 cites·13 claims
- 0685US4735824AMethod of manufacturing an MOS capacitorTOSHIBA KK·Filed 1986·Granted Apr 5, 1988·46 cites·14 claims
- 0784US6185472B1Semiconductor device manufacturing method, manufacturing apparatus, simulation method and simulatorTOSHIBA KK·Filed 1996·Granted Feb 6, 2001·76 cites·120 claims
- 0883US5514904ASemiconductor device with monocrystalline gate insulating filmTOSHIBA KK·Filed 1994·Granted May 7, 1996·57 cites·32 claims
- 0977US5431561AMethod and apparatus for heat treatingTOSHIBA KK·Filed 1993·Granted Jul 11, 1995·25 cites·2 claims
- 1074US5360748AMethod of manufacturing a semiconductor deviceTOSHIBA KK·Filed 1993·Granted Nov 1, 1994·53 cites·11 claims
- 1173US5757063ASemiconductor device having an extrinsic gettering filmTOSHIBA KK·Filed 1996·Granted May 26, 1998·47 cites·7 claims
- 1271US8034179B2Method for insulating film formation, storage medium from which information is readable with computer, and processing systemTOKYO ELECTRON LTD·Filed 2009·Granted Oct 11, 2011·3 cites·17 claims
- 1368US5297956AMethod and apparatus for heat treatingTOSHIBA KK·Filed 1991·Granted Mar 29, 1994·17 cites·3 claims
- 1467US5698891ASemiconductor device and method for manufacturing the sameTOSHIBA KK·Filed 1996·Granted Dec 16, 1997·34 cites·15 claims
- 1563US5885905ASemiconductor substrate and method of processing the sameTOSHIBA KK·Filed 1996·Granted Mar 23, 1999·26 cites·8 claims
- 1655US5543334AMethod of screening semiconductor deviceTOSHIBA KK·Filed 1994·Granted Aug 6, 1996·27 cites·15 claims
- 1754US5239614ASubstrate heating method utilizing heating element control to achieve horizontal temperature gradientTEL SAGAMI LTD·Filed 1991·Granted Aug 24, 1993·27 cites·16 claims
- 1851US8026187B2Method of forming silicon oxide film and method of production of semiconductor memory device using this methodTOKYO ELECTRON LTD·Filed 2009·Granted Sep 27, 2011·0 cites·19 claims
- 1949US5173440AMethod of fabricating a semiconductor device by reducing the impuritiesTOSHIBA KK·Filed 1990·Granted Dec 22, 1992·18 cites·17 claims
- 2045US5354710AMethod of manufacturing semiconductor devices using an adsorption enhancement layerTOSHIBA KK·Filed 1993·Granted Oct 11, 1994·17 cites·9 claims
- 2141US5073813ASemiconductor device having buried element isolation regionTOSHIBA KK·Filed 1990·Granted Dec 17, 1991·11 cites·7 claims
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