Inventor · disambiguated record
Kenji Itoga
Also filed as: ITOGA KENJI
11 granted patents·1 pending application·75 citations·filing 1991–2013
87Inventor score
Top patents by PatentIndex Score
12 records- 0184US6521889B1Dust particle inspection apparatus, and device manufacturing method using the sameCANON KK·Filed 2000·Granted Feb 18, 2003·25 cites·15 claims
- 0268US8348490B2Planar light source device and method of manufacturing divided prism moldMITSUBISHI ELECTRIC CORP·Filed 2009·Granted Jan 8, 2013·4 cites·11 claims
- 0364US5155651ALevitator with rotation controlNAT SPACE DEV AGENCY·Filed 1991·Granted Oct 13, 1992·34 cites·31 claims
- 0460US8885118B2Illumination device and liquid crystal display having a light guide plate with protrusions of multiple heightsYUUKI AKIMASA·Filed 2011·Granted Nov 11, 2014·2 cites·7 claims
- 0553US7197108B2Method of fabricating X-ray mask and method of fabricating semiconductor device using the X-ray maskMITSUBISHI ELECTRIC CORP·Filed 2003·Granted Mar 27, 2007·3 cites·18 claims
- 0653US6735275B2X-ray exposure method, x-ray exposure apparatus, fine structure and semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2002·Granted May 11, 2004·4 cites·17 claims
- 0751US6947518B2X-ray exposure apparatus, X-ray exposure method, X-ray mask, X-ray mirror, synchrotron radiation apparatus, synchrotron radiation method and semiconductor deviceCANON KK·Filed 2001·Granted Sep 20, 2005·3 cites·8 claims
- 0846US9500795B2Area light source device and display device using sameMITSUBISHI ELECTRIC CORP·Filed 2013·Granted Nov 22, 2016·0 cites·16 claims
- 0938US6901133B2X-ray exposure method and semiconductor device manufactured using this X-ray exposure method as well as X-ray mask, X-ray exposure unit and resist materialMITSUBISHI ELECTRIC CORP·Filed 2002·Granted May 31, 2005·0 cites·3 claims
- 1036US6947519B2X-ray exposure apparatus and method, semiconductor manufacturing apparatus, and microstructureMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Sep 20, 2005·0 cites·16 claims
- 1133US2002196896A1Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructureMITSUBISHI ELECTRIC CORP·Filed 2001·Application pending·0 cites
- 1230US6770408B2Dust particle inspection method for X-ray maskCANON KK·Filed 2002·Granted Aug 3, 2004·0 cites·2 claims
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