Inventor · disambiguated record
Christophe Pierrat
Also filed as: PIERRAT CHRISTOPHE
180 granted patents·12 pending applications·7,676 citations·filing 1991–2013
99Inventor score
Files withMICRON TECHNOLOGY INC81NUMERICAL TECH INC36SYNOPSYS INC34PIERRAT CHRISTOPHE10AT & T BELL LAB7
Top patents by PatentIndex Score
192 records- 0199US7155689B2Design-manufacturing interface via a unified modelMAGMA DESIGN AUTOMATION INC·Filed 2003·Granted Dec 26, 2006·357 cites·55 claims
- 0299US7132203B2Phase shift masking for complex patterns with proximity adjustmentsSYNOPSYS INC·Filed 2004·Granted Nov 7, 2006·228 cites·34 claims
- 0399US7028285B2Standard cell design incorporating phase informationSYNOPSYS INC·Filed 2002·Granted Apr 11, 2006·262 cites·31 claims
- 0499US6978436B2Design data format and hierarchy management for phase processingSYNOPSYS INC·Filed 2002·Granted Dec 20, 2005·207 cites·6 claims
- 0599US6968527B2High yield reticle with proximity effect halosSYNOPSYS INC·Filed 2003·Granted Nov 22, 2005·217 cites·30 claims
- 0699US6918104B2Dissection of printed edges from a fabrication layout for correcting proximity effectsSYNOPSYS INC·Filed 2003·Granted Jul 12, 2005·215 cites·33 claims
- 0799US6777138B2Mask product made by selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabricat layoutNUMERICAL TECH INC·Filed 2002·Granted Aug 17, 2004·209 cites·4 claims
- 0899US6453457B1Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layoutNUMERICAL TECH INC·Filed 2000·Granted Sep 17, 2002·277 cites·76 claims
- 0998US7312003B2Design and layout of phase shifting photolithographic masksSYNOPSYS INC·Filed 2004·Granted Dec 25, 2007·116 cites·5 claims
- 1098US7122281B2Critical dimension control using full phase and trim masksSYNOPSYS INC·Filed 2002·Granted Oct 17, 2006·142 cites·17 claims
- 1198US6787271B2Design and layout of phase shifting photolithographic masksNUMERICAL TECH INC·Filed 2002·Granted Sep 7, 2004·84 cites·27 claims
- 1298US6665856B1Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effectsNUMERICAL TECH INC·Filed 2000·Granted Dec 16, 2003·115 cites·60 claims
- 1398US6091845AInspection technique of photomaskMICRON TECHNOLOGY INC·Filed 1998·Granted Jul 18, 2000·314 cites·32 claims
- 1497US7926001B2Uniformity for semiconductor patterning operationsCADENCE DESIGN SYSTEMS INC·Filed 2008·Granted Apr 12, 2011·49 cites·18 claims
- 1597US6807663B2Accelerated layout processing using OPC pre-processingNUMERICAL TECH INC·Filed 2002·Granted Oct 19, 2004·230 cites·26 claims
- 1697US6792590B1Dissection of edges with projection points in a fabrication layout for correcting proximity effectsNUMERICAL TECH INC·Filed 2000·Granted Sep 14, 2004·78 cites·36 claims
- 1797US6745372B2Method and apparatus for facilitating process-compliant layout optimizationNUMERICAL TECH INC·Filed 2002·Granted Jun 1, 2004·243 cites·32 claims
- 1897US6625801B1Dissection of printed edges from a fabrication layout for correcting proximity effectsNUMERICAL TECH INC·Filed 2000·Granted Sep 23, 2003·91 cites·16 claims
- 1997US6272236B1Inspection technique of photomaskMICRON TECHNOLOGY INC·Filed 2000·Granted Aug 7, 2001·155 cites·32 claims
- 2097US6120952AMethods of reducing proximity effects in lithographic processesMICRON TECHNOLOGY INC·Filed 1998·Granted Sep 19, 2000·155 cites·35 claims
- 2197US5795688AProcess for detecting defects in photomasks through aerial image comparisonsMICRON TECHNOLOGY INC·Filed 1996·Granted Aug 18, 1998·206 cites·24 claims
- 2296US8479125B2Lithography modeling and applicationsPIERRAT CHRISTOPHE·Filed 2010·Granted Jul 2, 2013·14 cites·30 claims
- 2396US6753115B2Facilitating minimum spacing and/or width control optical proximity correctionNUMERICAL TECH INC·Filed 2001·Granted Jun 22, 2004·76 cites·32 claims
- 2496US6539521B1Dissection of corners in a fabrication layout for correcting proximity effectsNUMERICAL TECH INC·Filed 2000·Granted Mar 25, 2003·84 cites·40 claims
- 2595US6733929B2Phase shift masking for complex patterns with proximity adjustmentsNUMERICAL TECH INC·Filed 2002·Granted May 11, 2004·61 cites·37 claims
- 2695US6557162B1Method for high yield reticle formationNUMERICAL TECH INC·Filed 2000·Granted Apr 29, 2003·49 cites·45 claims
- 2795US6523165B2Alternating phase shift mask design conflict resolutionNUMERICAL TECH INC·Filed 2001·Granted Feb 18, 2003·85 cites·26 claims
- 2895US5998069AElectrically programmable photolithography maskMICRON TECHNOLOGY INC·Filed 1998·Granted Dec 7, 1999·96 cites·25 claims
- 2994US6721938B2Optical proximity correction for phase shifting photolithographic masksNUMERICAL TECH INC·Filed 2002·Granted Apr 13, 2004·62 cites·53 claims
- 3094US6584609B1Method and apparatus for mixed-mode optical proximity correctionNUMERICAL TECH INC·Filed 2000·Granted Jun 24, 2003·99 cites·16 claims
- 3194US6541165B1Phase shift mask sub-resolution assist featuresNUMERICAL TECH INC·Filed 2000·Granted Apr 1, 2003·57 cites·21 claims
- 3294US5885734AProcess for modifying a hierarchical mask layoutMICRON TECHNOLOGY INC·Filed 1996·Granted Mar 23, 1999·142 cites·20 claims
- 3393US6503666B1Phase shift masking for complex patternsNUMERICAL TECH INC·Filed 2000·Granted Jan 7, 2003·48 cites·51 claims
- 3493US5741624AMethod for reducing photolithographic steps in a semiconductor interconnect processMICRON TECHNOLOGY INC·Filed 1996·Granted Apr 21, 1998·100 cites·11 claims
- 3593US5582939AMethod for fabricating and using defect-free phase shifting masksMICRON TECHNOLOGY INC·Filed 1995·Granted Dec 10, 1996·99 cites·35 claims
- 3692US6653026B2Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting maskNUMERICAL TECH INC·Filed 2000·Granted Nov 25, 2003·37 cites·56 claims
- 3792US6560766B2Method and apparatus for analyzing a layout using an instance-based representationNUMERICAL TECH INC·Filed 2001·Granted May 6, 2003·82 cites·39 claims
- 3892US6040892AMultiple image reticle for forming layersMICRON TECHNOLOGY INC·Filed 1997·Granted Mar 21, 2000·59 cites·18 claims
- 3992US5801954AProcess for designing and checking a mask layoutMICRON TECHNOLOGY INC·Filed 1996·Granted Sep 1, 1998·133 cites·6 claims
- 4091US6255024B1Use of attenuating phase-shifting mask for improved printability of clear-field patternsMICRON TECHNOLOGY INC·Filed 2000·Granted Jul 3, 2001·33 cites·30 claims
- 4190US8103984B1System and method for compressed design phase contour dataPIERRAT CHRISTOPHE·Filed 2009·Granted Jan 24, 2012·11 cites·22 claims
- 4290US7562319B2Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effectsSYNOPSYS INC·Filed 2006·Granted Jul 14, 2009·8 cites·5 claims
- 4390US7500217B2Handling of flat data for phase processing including growing shapes within bins to identify clustersSYNOPSYS INC·Filed 2005·Granted Mar 3, 2009·9 cites·28 claims
- 4490US7003757B2Dissection of edges with projection points in a fabrication layout for correcting proximity effectsSYNOPSYS INC·Filed 2004·Granted Feb 21, 2006·29 cites·8 claims
- 4590US6961186B2Contact printing using a magnified mask imageTAKUMI TECHNOLOGY CORP·Filed 2003·Granted Nov 1, 2005·35 cites·21 claims
- 4690US6785879B2Model-based data conversionNUMERICAL TECH INC·Filed 2002·Granted Aug 31, 2004·30 cites·24 claims
- 4790US6524752B1Phase shift masking for intersecting linesNUMERICAL TECH INC·Filed 2000·Granted Feb 25, 2003·31 cites·93 claims
- 4889US8198188B1Self-aligned VIAS for semiconductor devicesPIERRAT CHRISTOPHE·Filed 2009·Granted Jun 12, 2012·13 cites·17 claims
- 4989US7165234B2Model-based data conversionSYNOPSYS INC·Filed 2004·Granted Jan 16, 2007·27 cites·12 claims
- 5089US6954911B2Method and system for simulating resist and etch edgesSYNOPSYS INC·Filed 2002·Granted Oct 11, 2005·44 cites·12 claims
Showing the top 50 of 192 patent records by PatentIndex Score.
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