Inventor · disambiguated record
Nace Layadi
Also filed as: LAYADI NACE
26 granted patents·4 pending applications·533 citations·filing 1999–2005
97Inventor score
Files withAGERE SYSTEMS INC11AGERE SYST GUARDIAN CORP10CHARTERED SEMICONDUCTOR MFG4LUCENT TECHNOLOGIES INC3
Top patents by PatentIndex Score
30 records- 0196US6910907B2Contact for use in an integrated circuit and a method of manufacture thereforAGERE SYSTEMS INC·Filed 2003·Granted Jun 28, 2005·115 cites·20 claims
- 0290US6180518B1Method for forming vias in a low dielectric constant materialLUCENT TECHNOLOGIES INC·Filed 1999·Granted Jan 30, 2001·100 cites·32 claims
- 0388US6984166B2Zone polishing using variable slurry solid contentCHARTERED SEMICONDUCTOR MFG·Filed 2003·Granted Jan 10, 2006·35 cites·17 claims
- 0474US6436829B1Two phase chemical/mechanical polishing process for tungsten layersAGERE SYST GUARDIAN CORP·Filed 2000·Granted Aug 20, 2002·16 cites·28 claims
- 0574US6258610B1Method analyzing a semiconductor surface using line width metrology with auto-correlation operationAGERE SYST GUARDIAN CORP·Filed 1999·Granted Jul 10, 2001·45 cites·12 claims
- 0671US6821886B1IMP TiN barrier metal processCHARTERED SEMICONDUCTOR MFG·Filed 2003·Granted Nov 23, 2004·19 cites·45 claims
- 0764US6977128B2Multi-layered semiconductor structureAGERE SYSTEMS INC·Filed 2003·Granted Dec 20, 2005·9 cites·19 claims
- 0864US6472307B1Methods for improved encapsulation of thick metal features in integrated circuit fabricationAGERE SYST GUARDIAN CORP·Filed 2000·Granted Oct 29, 2002·10 cites·30 claims
- 0963US6656850B2Method for in-situ removal of side walls in MOM capacitor formationAGERE SYSTEMS INC·Filed 2002·Granted Dec 2, 2003·7 cites·8 claims
- 1060US7163438B2Zone polishing using variable slurry solid contentCHARTERED SEMICONDUCTOR MFG·Filed 2005·Granted Jan 16, 2007·2 cites·8 claims
- 1159US6730600B2Method of dry etching a semiconductor device in the absence of a plasmaAGERE SYSTEMS INC·Filed 2002·Granted May 4, 2004·6 cites·15 claims
- 1257US6218255B1Method of making a capacitorAGERE SYST GUARDIAN CORP·Filed 1999·Granted Apr 17, 2001·18 cites·20 claims
- 1355US6204186B1Method of making integrated circuit capacitor including tapered plugLUCENT TECHNOLOGIES INC·Filed 1999·Granted Mar 20, 2001·20 cites·29 claims
- 1454US6585830B2Method for cleaning tungsten from deposition wall chambersAGERE SYSTEMS INC·Filed 2000·Granted Jul 1, 2003·1 cites·16 claims
- 1553US6218085B1Process for photoresist rework to avoid sodium incorporationLUCENT TECHNOLOGIES INC·Filed 1999·Granted Apr 17, 2001·14 cites·20 claims
- 1652US6720604B1Capacitor for an integrated circuitAGERE SYSTEMS INC·Filed 1999·Granted Apr 13, 2004·16 cites·16 claims
- 1752US6706609B2Method of forming an alignment feature in or on a multi-layered semiconductor structureAGERE SYSTEMS INC·Filed 2001·Granted Mar 16, 2004·4 cites·19 claims
- 1852US6576529B1Method of forming an alignment feature in or on a multilayered semiconductor structureAGERE SYSTEMS INC·Filed 1999·Granted Jun 10, 2003·14 cites·6 claims
- 1951US6406999B1Semiconductor device having reduced line width variations between tightly spaced and isolated featuresAGERE SYST GUARDIAN CORP·Filed 1999·Granted Jun 18, 2002·17 cites·15 claims
- 2049US6249016B1Integrated circuit capacitor including tapered plugAGERE SYST GUARDIAN CORP·Filed 1999·Granted Jun 19, 2001·11 cites·33 claims
- 2148US6395639B1Process for improving line width variations between tightly spaced and isolated features in integrated circuitsAGERE SYST GUARDIAN CORP·Filed 1999·Granted May 28, 2002·15 cites·22 claims
- 2247US6548906B2Method for reducing a metal seam in an interconnect structure and a device manufactured therebyAGERE SYSTEMS INC·Filed 2001·Granted Apr 15, 2003·2 cites·9 claims
- 2346US6727588B1Diffusion preventing barrier layer in integrated circuit inter-metal layer dielectricsAGERE SYSTEMS INC·Filed 1999·Granted Apr 27, 2004·15 cites·13 claims
- 2446US6458648B1Method for in-situ removal of side walls in MOM capacitor formationAGERE SYST GUARDIAN CORP·Filed 1999·Granted Oct 1, 2002·10 cites·20 claims
- 2543US6358790B1Method of making a capacitorAGERE SYST GUARDIAN CORP·Filed 1999·Granted Mar 19, 2002·8 cites·14 claims
- 2638US2005106835A1Trench isolation structure and method of manufacture thereforAGERE SYSTEMS INC·Filed 2003·Application pending·0 cites
- 2736US2002180052A1Polish or etch stop layerFiled 2001·Application pending·0 cites
- 2835US2005134857A1Method to monitor silicide formation on product wafersCHARTERED SEMICONDUCTOR MFG·Filed 2003·Application pending·0 cites
- 2935US2003228755A1Method for metal patterning and improved linewidth controlFiled 2002·Application pending·0 cites
- 3034US6323537B1Capacitor for an integrated circuitAGERE SYST GUARDIAN CORP·Filed 1999·Granted Nov 27, 2001·4 cites·11 claims
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