Inventor · disambiguated record
Mahmoud Khojasteh
Also filed as: KHOJASTEH MAHMOUD · KHOJASTEH MAHMOUD M · KHOJASTEH MAHMOUD MOSTAFA
50 granted patents·5 pending applications·450 citations·filing 1985–2019
98Inventor score
Files withIBM42AFZALI-ARDAKANI ALI5ADVANCED TECH MATERIALS2BREEN CARMICHAEL TRICIA1CHEN KUANG-JUNG J1
Top patents by PatentIndex Score
55 records- 0193US10388727B2Stacked indium gallium arsenide nanosheets on silicon with bottom trapezoid isolationIBM·Filed 2017·Granted Aug 20, 2019·7 cites·20 claims
- 0291US8647445B1Process for cleaning semiconductor devices and/or tooling during manufacturing thereofIBM·Filed 2012·Granted Feb 11, 2014·12 cites·17 claims
- 0391US8026200B2Low pH mixtures for the removal of high density implanted resistADVANCED TECH MATERIALS·Filed 2009·Granted Sep 27, 2011·19 cites·26 claims
- 0491US7087267B2Materials and methods for immobilization of catalysts on surfaces and for selective electroless metallizationIBM·Filed 2001·Granted Aug 8, 2006·45 cites·16 claims
- 0590US8618036B2Aqueous cerium-containing solution having an extended bath lifetime for removing mask materialAFZALI-ARDAKANI ALI·Filed 2011·Granted Dec 31, 2013·11 cites·23 claims
- 0690US8367556B1Use of an organic planarizing mask for cutting a plurality of gate linesIBM·Filed 2011·Granted Feb 5, 2013·10 cites·23 claims
- 0790US8367555B2Removal of masking materialIBM·Filed 2009·Granted Feb 5, 2013·15 cites·38 claims
- 0888US7141692B2Molecular photoresists containing nonpolymeric silsesquioxanesIBM·Filed 2003·Granted Nov 28, 2006·19 cites·69 claims
- 0988US6818381B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2001·Granted Nov 16, 2004·21 cites·11 claims
- 1087US7563563B2Wet developable bottom antireflective coating composition and method for use thereofIBM·Filed 2006·Granted Jul 21, 2009·8 cites·1 claims
- 1186US8455366B1Use of an organic planarizing mask for cutting a plurality of gate linesFULLER NICHOLAS C M·Filed 2012·Granted Jun 4, 2013·7 cites·17 claims
- 1285US8017303B2Ultra low post exposure bake photoresist materialsIBM·Filed 2009·Granted Sep 13, 2011·7 cites·32 claims
- 1385US5609989AAcid scavengers for use in chemically amplified photoresistsIBM·Filed 1995·Granted Mar 11, 1997·47 cites·11 claims
- 1482US10748990B2Stacked indium gallium arsenide nanosheets on silicon with bottom trapezoid isolationIBM·Filed 2019·Granted Aug 18, 2020·2 cites·20 claims
- 1582US10276384B2Plasma shallow doping and wet removal of depth control capIBM·Filed 2017·Granted Apr 30, 2019·2 cites·14 claims
- 1680US7217496B2Fluorinated photoresist materials with improved etch resistant propertiesIBM·Filed 2004·Granted May 15, 2007·15 cites·26 claims
- 1779US7862860B2Materials and methods for immobilization of catalysts on surfaces and for selective electroless metallizationIBM·Filed 2006·Granted Jan 4, 2011·4 cites·2 claims
- 1877US6927015B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2004·Granted Aug 9, 2005·10 cites·5 claims
- 1975US9881793B2Neutral hard mask and its application to graphoepitaxy-based directed self-assembly (DSA) patterningIBM·Filed 2015·Granted Jan 30, 2018·2 cites·19 claims
- 2075US8563408B2Spin-on formulation and method for stripping an ion implanted photoresistAFZALI-ARDAKANI ALI·Filed 2012·Granted Oct 22, 2013·2 cites·20 claims
- 2175US8252673B2Spin-on formulation and method for stripping an ion implanted photoresistAFZALI-ARDAKANI ALI·Filed 2009·Granted Aug 28, 2012·3 cites·17 claims
- 2273US10615271B2III-V lateral bipolar junction transistor on local facetted buried oxide layerIBM·Filed 2017·Granted Apr 7, 2020·1 cites·12 claims
- 2373US9058976B2Cleaning composition and process for cleaning semiconductor devices and/or tooling during manufacturing thereofIBM·Filed 2012·Granted Jun 16, 2015·2 cites·6 claims
- 2472US4665006APositive resist system having high resistance to oxygen reactive ion etchingIBM·Filed 1985·Granted May 12, 1987·21 cites·13 claims
- 2571US8920567B2Post metal chemical-mechanical planarization cleaning processIBM·Filed 2013·Granted Dec 30, 2014·3 cites·20 claims
- 2670US5919597AMethods for preparing photoresist compositionsIBM CORP OF ARMONK·Filed 1997·Granted Jul 6, 1999·34 cites·28 claims
- 2767US11444185B2III-V lateral bipolar junction transistor on local facetted buried oxide layerIBM·Filed 2019·Granted Sep 13, 2022·0 cites·20 claims
- 2866US11437502B2III-V lateral bipolar junction transistor on local facetted buried oxide layerIBM·Filed 2019·Granted Sep 6, 2022·0 cites·19 claims
- 2965US8574680B2Materials and methods for immobilization of catalysts on surfaces and for selective electroless metallizationBREEN CARMICHAEL TRICIA·Filed 2010·Granted Nov 5, 2013·1 cites·7 claims
- 3064US6103447AApproach to formulating irradiation sensitive positive resistsIBM·Filed 1998·Granted Aug 15, 2000·25 cites·27 claims
- 3163US7183036B2Low activation energy positive resistIBM·Filed 2004·Granted Feb 27, 2007·6 cites·20 claims
- 3262US5667938AAcid scavengers for use in chemically amplified photoresistsIBM·Filed 1996·Granted Sep 16, 1997·15 cites·6 claims
- 3360US6770419B2Low silicon-outgassing resist for bilayer lithographyIBM·Filed 2002·Granted Aug 3, 2004·14 cites·7 claims
- 3460US2014121096A1Materials and methods for immobilization of catalysts on surfaces and for selective electroless metallizationIBM·Filed 2013·Application pending·0 cites
- 3558US9536731B2Wet clean process for removing CxHyFz etch residueIBM·Filed 2014·Granted Jan 3, 2017·0 cites·15 claims
- 3658US6303263B1Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groupsINTERNAT BUSINESS MACHINES MAC·Filed 1998·Granted Oct 16, 2001·24 cites·24 claims
- 3757US8445316B2Non-lithographic method of patterning contacts for a photovoltaic deviceAFZALI-ARDAKANI ALI·Filed 2011·Granted May 21, 2013·0 cites·25 claims
- 3857US7129016B2Positive resist containing naphthol functionalityIBM·Filed 2004·Granted Oct 31, 2006·4 cites·21 claims
- 3956US8455420B2Spin-on formulation and method for stripping an ion implanted photoresistAFZALI-ARDAKANI ALI·Filed 2012·Granted Jun 4, 2013·0 cites·17 claims
- 4056US7326523B2Low refractive index polymers as underlayers for silicon-containing photoresistsIBM·Filed 2004·Granted Feb 5, 2008·3 cites·9 claims
- 4156US2018218909A1Plasma shallow doping and wet removal of depth control capIBM·Filed 2018·Application pending·0 cites
- 4256US2018218908A1Plasma shallow doping and wet removal of depth control capIBM·Filed 2018·Application pending·0 cites
- 4355US10167443B2Wet clean process for removing CxHyFz etch residueIBM·Filed 2016·Granted Jan 1, 2019·0 cites·5 claims
- 4455US8202678B2Wet developable bottom antireflective coating composition and method for use thereofCHEN KUANG-JUNG J·Filed 2009·Granted Jun 19, 2012·0 cites·21 claims
- 4554US7439302B2Low refractive index polymers as underlayers for silicon-containing photoresistsIBM·Filed 2005·Granted Oct 21, 2008·3 cites·5 claims
- 4654US2015024989A1Cleaning composition and process for cleaning semiconductor devices and/or tooling during manufacturing thereofIBM·Filed 2014·Application pending·0 cites
- 4752US10546928B2Forming stacked twin III-V nano-sheets using aspect-ratio trapping techniquesIBM·Filed 2017·Granted Jan 28, 2020·0 cites·20 claims
- 4850US7608390B2Top antireflective coating composition containing hydrophobic and acidic groupsIBM·Filed 2006·Granted Oct 27, 2009·0 cites·1 claims
- 4949US8304178B2Top antireflective coating composition containing hydrophobic and acidic groupsKHOJASTEH MAHMOUD·Filed 2009·Granted Nov 6, 2012·0 cites·12 claims
- 5048US6140015APhotoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branchingIBM·Filed 1998·Granted Oct 31, 2000·9 cites·17 claims
Showing the top 50 of 55 patent records by PatentIndex Score.
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