Inventor · disambiguated record
Gene Everad Parris
Also filed as: PARRIS GENE E · PARRIS GENE EVERAD
18 granted patents·4 pending applications·132 citations·filing 1988–2016
93Inventor score
Files withAIR PROD & CHEM14TAMBOLI DNYANESH CHANDRAKANT2VERSUM MAT US LLC2MCDERMOTT WAYNE T1WEIGEL SCOTT J1
Top patents by PatentIndex Score
22 records- 0186US9873833B2Etchant solutions and method of use thereofAIR PROD & CHEM·Filed 2015·Granted Jan 23, 2018·3 cites·24 claims
- 0285US4942259AProcess for preparing n-vinyl amidesAIR PROD & CHEM·Filed 1988·Granted Jul 17, 1990·20 cites·19 claims
- 0381US5753716AUse of aluminum phosphate as the dehydration catalyst in single step dimethyl ether processAIR PROD & CHEM·Filed 1997·Granted May 19, 1998·44 cites·4 claims
- 0478US6329549B1Dimethyl ether for methyl group attachment on a carbon adjacent to an electron withdrawing groupAIR PROD & CHEM·Filed 2000·Granted Dec 11, 2001·9 cites·24 claims
- 0577US8007986B2Immersion lithography fluidsAIR PROD & CHEM·Filed 2007·Granted Aug 30, 2011·5 cites·17 claims
- 0677US7879531B2Immersion lithography fluidsAIR PROD & CHEM·Filed 2005·Granted Feb 1, 2011·4 cites·13 claims
- 0776US7195676B2Method for removal of flux and other residue in dense fluid systemsAIR PROD & CHEM·Filed 2004·Granted Mar 27, 2007·12 cites·8 claims
- 0870US4900832AProcess for the catalytic animation of alcohols and diols using non-acidic hydroxyapatite catalystsAIR PROD & CHEM·Filed 1988·Granted Feb 13, 1990·8 cites·13 claims
- 0969US10072237B2Photoresist cleaning composition used in photolithography and a method for treating substrate therewithAIR PROD & CHEM·Filed 2016·Granted Sep 11, 2018·1 cites·20 claims
- 1069US5059713AProcess for the preparation of n-vinyl amidesAIR PROD & CHEM·Filed 1990·Granted Oct 22, 1991·10 cites·17 claims
- 1167US10400167B2Etching compositions and methods for using sameVERSUM MAT US LLC·Filed 2016·Granted Sep 3, 2019·1 cites·22 claims
- 1266US10301580B2Stripping compositions having high WN/W etching selectivityVERSUM MAT US LLC·Filed 2015·Granted May 28, 2019·1 cites·29 claims
- 1365US10073351B2Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivationAIR PROD & CHEM·Filed 2015·Granted Sep 11, 2018·1 cites·16 claims
- 1463US5399769APreparation of methylamines using shape selective chabazitesAIR PROD & CHEM·Filed 1994·Granted Mar 21, 1995·7 cites·21 claims
- 1560US8883701B2Method for wafer dicing and composition useful thereofTAMBOLI DNYANESH CHANDRAKANT·Filed 2011·Granted Nov 11, 2014·1 cites·10 claims
- 1660US7211553B2Processing of substrates with dense fluids comprising acetylenic diols and/or alcoholsAIR PROD & CHEM·Filed 2003·Granted May 1, 2007·3 cites·14 claims
- 1756US2007137675A1Method for removal of flux and other residue in dense fluid systemsMCDERMOTT WAYNE T·Filed 2007·Application pending·0 cites
- 1851US9328318B2Method for wafer dicing and composition useful thereofTAMBOLI DNYANESH CHANDRAKANT·Filed 2014·Granted May 3, 2016·0 cites·11 claims
- 1945US2005029492A1Processing of semiconductor substrates with dense fluids comprising acetylenic diols and/or alcoholsFiled 2003·Application pending·0 cites
- 2039US2007196773A1Top coat for lithography processesWEIGEL SCOTT J·Filed 2007·Application pending·0 cites
- 2139US2005161644A1Immersion lithography fluidsFiled 2004·Application pending·0 cites
- 2235US4950690AProcess for the animation of alcohols using activated phosphorus-containing catalystsAIR PROD & CHEM·Filed 1988·Granted Aug 21, 1990·2 cites·17 claims
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