Inventor · disambiguated record
Kazutake Taniguchi
Also filed as: TANIGUCHI KAZUTAKE
5 granted patents·4 pending applications·1 citations·filing 2010–2022
62Inventor score
Top patents by PatentIndex Score
9 records- 0172US11624979B2Mask blank, transfer mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2022·Granted Apr 11, 2023·0 cites·10 claims
- 0270US11022875B2Mask blank, phase shift mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted Jun 1, 2021·1 cites·27 claims
- 0357US11314162B2Mask blank, transfer mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Apr 26, 2022·0 cites·20 claims
- 0451US12326656B2Mask blank and method of manufacturing photomaskHOYA CORP·Filed 2021·Granted Jun 10, 2025·0 cites·10 claims
- 0550US2024094621A1Mask blank and reflective maskHOYA CORP·Filed 2022·Application pending·0 cites
- 0643US11314161B2Mask blank, phase shift mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted Apr 26, 2022·0 cites·50 claims
- 0738US2014234468A1Mold blank, master mold, method of manufacturing copy mold and mold blankTANIGUCHI KAZUTAKE·Filed 2012·Application pending·0 cites
- 0834US2019302604A1Mask blank, phase shift mask, method of manufacturing phase shift mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2017·Application pending·0 cites
- 0933US2012135353A1Functionally gradient inorganic resist, substrate with functionally gradient inorganic resist, cylindrical base material with functionally gradient inorganic resist, method for forming functionally gradient inorganic resist and method for forming fine pattern, and inorganic resist and method for forming the sameAMEMIYA ISAO·Filed 2010·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →