Inventor · disambiguated record
Junichi Kai
Also filed as: KAI JUNICHI
30 granted patents·1,035 citations·filing 1982–2002
98Inventor score
Files withFUJITSU LTD30
Top patents by PatentIndex Score
30 records- 0197US5369282AElectron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughputFUJITSU LTD·Filed 1993·Granted Nov 29, 1994·143 cites·22 claims
- 0297US5260579ACharged particle beam exposure system and charged particle beam exposure methodFUJITSU LTD·Filed 1992·Granted Nov 9, 1993·167 cites·33 claims
- 0391US6646275B2Charged particle beam exposure system and methodFUJITSU LTD·Filed 2002·Granted Nov 11, 2003·43 cites·7 claims
- 0489US6064807ACharged-particle beam exposure system and methodFUJITSU LTD·Filed 1996·Granted May 16, 2000·77 cites·32 claims
- 0588US5841145AMethod of and system for exposing pattern on object by charged particle beamFUJITSU LTD·Filed 1996·Granted Nov 24, 1998·60 cites·45 claims
- 0686US5399872ACharged-particle beam exposure methodFUJITSU LTD·Filed 1993·Granted Mar 21, 1995·51 cites·7 claims
- 0785US4980567ACharged particle beam exposure system using line beamsFUJITSU LTD·Filed 1989·Granted Dec 25, 1990·34 cites·12 claims
- 0883US5719402AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1996·Granted Feb 17, 1998·32 cites·11 claims
- 0983US5528048ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1995·Granted Jun 18, 1996·47 cites·21 claims
- 1079US5614725ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1996·Granted Mar 25, 1997·36 cites·12 claims
- 1177US5329130ACharged particle beam exposure method and apparatusFUJITSU LTD·Filed 1992·Granted Jul 12, 1994·33 cites·12 claims
- 1276US6118129AMethod and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elementsFUJITSU LTD·Filed 1999·Granted Sep 12, 2000·30 cites·15 claims
- 1376US5866300AMethod of and system for exposing pattern on object by charged particle beamFUJITSU LTD·Filed 1996·Granted Feb 2, 1999·25 cites·15 claims
- 1476US5546319AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1995·Granted Aug 13, 1996·21 cites·34 claims
- 1574US5977548ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1996·Granted Nov 2, 1999·28 cites·11 claims
- 1672US5334846ACorrection of charged particle beam exposure deflection by detecting stage position and a position detection markFUJITSU LTD·Filed 1992·Granted Aug 2, 1994·25 cites·14 claims
- 1769US5721432AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1996·Granted Feb 24, 1998·16 cites·5 claims
- 1867US5920077ACharged particle beam exposure systemFUJITSU LTD·Filed 1998·Granted Jul 6, 1999·21 cites·17 claims
- 1966US4586141AMethod and apparatus for an electron beam exposure systemFUJITSU LTD·Filed 1983·Granted Apr 29, 1986·28 cites·3 claims
- 2065US5965895AMethod of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposureFUJITSU LTD·Filed 1997·Granted Oct 12, 1999·13 cites·9 claims
- 2160US6057907AMethod of and system for exposing pattern on object by charged particle beamFUJITSU LTD·Filed 1998·Granted May 2, 2000·12 cites·3 claims
- 2258US5134300AMethod and apparatus for controlling charged particle beams in charged particle beam exposure systemFUJITSU LTD·Filed 1991·Granted Jul 28, 1992·14 cites·9 claims
- 2358US4950910AElectron beam exposure method and apparatusFUJITSU LTD·Filed 1989·Granted Aug 21, 1990·16 cites·15 claims
- 2455US5225684ACharged particle beam exposure apparatus control system and a method of operation for providing a drawing start signalFUJITSU LTD·Filed 1992·Granted Jul 6, 1993·12 cites·9 claims
- 2553US5610406ACharged particle beam exposure method and apparatusFUJITSU LTD·Filed 1995·Granted Mar 11, 1997·11 cites·16 claims
- 2651US5444257AElectron-beam exposure system for reduced distortion of electron beam spotFUJITSU LTD·Filed 1994·Granted Aug 22, 1995·8 cites·5 claims
- 2748US5631113AElectron-beam exposure system for reduced distortion of electron beam spotFUJITSU LTD·Filed 1995·Granted May 20, 1997·7 cites·6 claims
- 2843US5180920AMethod and apparatus for making charged particle beam exposureFUJITSU LTD·Filed 1992·Granted Jan 19, 1993·9 cites·20 claims
- 2942US5434795AMethod of forming pattern having optical angle in charged particle exposure systemFUJITSU LTD·Filed 1994·Granted Jul 18, 1995·6 cites·10 claims
- 3039US4516030AScanning electron beam exposure systemFUJITSU LTD·Filed 1982·Granted May 7, 1985·10 cites·3 claims
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