Inventor · disambiguated record
Makoto Nakase
Also filed as: NAKASE MAKOTO
24 granted patents·633 citations·filing 1990–2001
97Inventor score
Top patents by PatentIndex Score
24 records- 0192US5691101APhotosensitive compositionTOSHIBA KK·Filed 1996·Granted Nov 25, 1997·86 cites·7 claims
- 0290US6280897B1Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic partsTOSHIBA KK·Filed 1997·Granted Aug 28, 2001·80 cites·12 claims
- 0384US5837419APhotosensitive compositionTOSHIBA KK·Filed 1996·Granted Nov 17, 1998·44 cites·14 claims
- 0478US6228552B1Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive materialTOSHIBA KK·Filed 1997·Granted May 8, 2001·39 cites·19 claims
- 0577US6071670ATransparent resin, photosensitive composition, and method of forming a patternTOSHIBA KK·Filed 1997·Granted Jun 6, 2000·37 cites·43 claims
- 0675US6060207APhotosensitive materialTOSHIBA KK·Filed 1995·Granted May 9, 2000·36 cites·21 claims
- 0774US5837405AReticleTOSHIBA KK·Filed 1997·Granted Nov 17, 1998·28 cites·12 claims
- 0873US5932391AResist for alkali developmentTOSHIBA KK·Filed 1996·Granted Aug 3, 1999·31 cites·30 claims
- 0971US5234780AExposure mask, method of manufacturing the same, and exposure method using the sameTOSHIBA KK·Filed 1990·Granted Aug 10, 1993·20 cites·2 claims
- 1067US6291129B1Monomer, high molecular compound and photosensitive compositionTOSHIBA KK·Filed 1998·Granted Sep 18, 2001·22 cites·27 claims
- 1166US6045968APhotosensitive compositionTOSHIBA KK·Filed 1998·Granted Apr 4, 2000·26 cites·4 claims
- 1265US5928841AMethod of photoetching at 180 to 220TOSHIBA KK·Filed 1995·Granted Jul 27, 1999·20 cites·21 claims
- 1364US5589305AMethod of fabricating a reticleTOSHIBA KK·Filed 1995·Granted Dec 31, 1996·19 cites·12 claims
- 1462US6410748B1Alicycli c group-containing monomerTOSHIBA KK·Filed 2001·Granted Jun 25, 2002·15 cites·3 claims
- 1560US5756254AResist, method of forming a resist pattern and manufacturing an electronic parts using the resistTOSHIBA KK·Filed 1996·Granted May 26, 1998·25 cites·22 claims
- 1659US5863699APhoto-sensitive compositionTOSHIBA KK·Filed 1996·Granted Jan 26, 1999·24 cites·22 claims
- 1755US6168897B1Method of forming patternsTOSHIBA KK·Filed 1999·Granted Jan 2, 2001·12 cites·12 claims
- 1855US5660956AReticle and method of fabricating reticleTOSHIBA KK·Filed 1996·Granted Aug 26, 1997·16 cites·8 claims
- 1954US5595844AMethod of exposing light in a method of fabricating a reticleTOSHIBA KK·Filed 1995·Granted Jan 21, 1997·12 cites·10 claims
- 2054US5407786AMethod of forming a mask on a semiconductor substrate via photosensitive resin deposition, ammonia treatment and selective silylationTOSHIBA KK·Filed 1992·Granted Apr 18, 1995·14 cites·12 claims
- 2150US5358808AExposure mask, method of manufacturing the same, and exposure method using the sameTOSHIBA KK·Filed 1993·Granted Oct 25, 1994·10 cites·13 claims
- 2241US5188924APattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium saltTOSHIBA KK·Filed 1991·Granted Feb 23, 1993·6 cites·21 claims
- 2339US5853952AColor developing organic material, color developing resin composition and colored thin film patternTOSHIBA KK·Filed 1996·Granted Dec 29, 1998·7 cites·5 claims
- 2438USRE38256EPhotosensitive compositionTOKYO SHIBAURA ELECTRIC CO·Filed 1999·Granted Sep 23, 2003·4 cites·9 claims
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