Inventor · disambiguated record
Mark J. Willey
Also filed as: WILLEY MARK J
11 granted patents·2 pending applications·99 citations·filing 2007–2017
90Inventor score
Top patents by PatentIndex Score
13 records- 0195US8962085B2Wetting pretreatment for enhanced damascene metal fillingMAYER STEVEN T·Filed 2010·Granted Feb 24, 2015·20 cites·58 claims
- 0294US7776741B2Process for through silicon via filingNOVELLUS SYSTEMS INC·Filed 2008·Granted Aug 17, 2010·43 cites·30 claims
- 0389US8372258B2Monitoring of electroplating additivesNOVELLUS SYSTEMS INC·Filed 2009·Granted Feb 12, 2013·7 cites·23 claims
- 0486US8992757B2Through silicon via filling using an electrolyte with a dual state inhibitorWILLEY MARK J·Filed 2011·Granted Mar 31, 2015·10 cites·29 claims
- 0585US9721800B2Apparatus for wetting pretreatment for enhanced damascene metal fillingNOVELLUS SYSTEMS INC·Filed 2014·Granted Aug 1, 2017·5 cites·32 claims
- 0684US8722539B2Process for through silicon via fillingREID JONATHAN D·Filed 2011·Granted May 13, 2014·6 cites·31 claims
- 0783US9852913B2Wetting pretreatment for enhanced damascene metal fillingNOVELLUS SYSTEMS INC·Filed 2015·Granted Dec 26, 2017·3 cites·11 claims
- 0878US9816196B2Method and apparatus for electroplating semiconductor wafer when controlling cations in electrolyteNOVELLUS SYSTEMS INC·Filed 2013·Granted Nov 14, 2017·1 cites·19 claims
- 0977US9593426B2Through silicon via filling using an electrolyte with a dual state inhibitorNOVELLUS SYSTEMS INC·Filed 2015·Granted Mar 14, 2017·2 cites·18 claims
- 1067US8475642B2Systems and methods for monitoring plating and etching bathsWEST ALAN C·Filed 2007·Granted Jul 2, 2013·2 cites·21 claims
- 1163US2018030611A1Method and apparatus for electroplating semiconductor wafer when controlling cations in electrolyteNOVELLUS SYSTEMS INC·Filed 2017·Application pending·0 cites
- 1258US10840101B2Wetting pretreatment for enhanced damascene metal fillingNOVELLUS SYSTEMS INC·Filed 2017·Granted Nov 17, 2020·0 cites·16 claims
- 1342US2012064462A1By-product mitigation in through-silicon-via platingWILLEY MARK J·Filed 2011·Application pending·0 cites
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