Inventor · disambiguated record
Seung-Hune Yang
Also filed as: YANG SEUNG-HUNE
13 granted patents·2 pending applications·187 citations·filing 2001–2024
91Inventor score
Top patents by PatentIndex Score
15 records- 0193US7061582B2Exposure apparatus including micro mirror array and exposure method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 13, 2006·94 cites·12 claims
- 0287US9703189B2Method of calculating a shift vale of a cell contactSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jul 11, 2017·4 cites·5 claims
- 0385US8677288B2Test pattern selection method for OPC model calibrationVENGERTSEV DMITRY·Filed 2012·Granted Mar 18, 2014·8 cites·18 claims
- 0483US6627366B2Electron beam exposure method having good linearity with respect to producing fine patternsSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Sep 30, 2003·32 cites·29 claims
- 0581US8614034B2Method of manufacturing photo-maskMOON SEONG-HO·Filed 2012·Granted Dec 24, 2013·4 cites·20 claims
- 0675US11714347B2Process proximity correction method and the computing device for the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Aug 1, 2023·1 cites·20 claims
- 0773US6783905B2Electron beam exposure method using variable backward scattering coefficient and computer-readable recording medium having thereofSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Aug 31, 2004·16 cites·22 claims
- 0872US6775815B2Exposure method for correcting line width variation in a photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Aug 10, 2004·14 cites·10 claims
- 0968US9542740B2Method for detecting defect in patternSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jan 10, 2017·3 cites·11 claims
- 1061US6555275B2Technique of exposing a resist using electron beams having different accelerating voltages, and method of manufacturing a photomask using the techniqueSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Apr 29, 2003·7 cites·11 claims
- 1160US2025076847A1Method and computing device for manufacturing semiconductor device using transformer modelSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1253US10126646B2Method of calculating a shift value of a cell contactSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Nov 13, 2018·0 cites·15 claims
- 1349US7185312B2Exposure method for correcting line width variation in a photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Feb 27, 2007·2 cites·8 claims
- 1449US6641979B2Technique of exposing a resist using electron beams having different accelerating voltagesSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Nov 4, 2003·2 cites·6 claims
- 1533US2012237859A1Method of approximating value of critical dimension of pattern formed by photolithography and method of fabricating photomask including opc based on approximated value of a cd of a patternYANG SEUNG-HUNE·Filed 2012·Application pending·0 cites
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