Inventor

SCHILP ANDREA

DE36 patents

⚠️ This page may combine multiple inventors who share the name “SCHILP ANDREA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SCHILP ANDREA

BOSCH GMBH ROBERT

Method of anisotropically etching silicon

Anisotropic, fluorine-based plasma etching method for silicon

Method for anisotropic etching of silicon

Sensor and method for manufacturing a sensor

Method for anisotropic plasma etching of substrates

Method of anisotropic etching of silicon

Process for producing a speed of rotation coriolis sensor

Method and apparatus for anisotropic etching of substrates

Process for anisotropic plasma etching of different substrates

Method of manufacturing sensor

Method for anisotropic plasma etching of semiconductors

Process for making micromechanical structures

Device and method for etching a substrate using an inductively coupled plasma

Method for processing silicon using etching processes

Method for detecting the transition between different materials in semiconductor structures

Method for manufacturing a sensor

Method for manufacturing micro-mechanical components using selective anodization of silicon

Micromechanical acceleration or coriolis rotation-rate sensor

Plasma etching equipment

Methods for plasma etching of silicon

Plasma etching method having pulsed substrate electrode power

Plasma etching installation

Method for applying a protecting lacquer on a wafer

Device and method for determining the lateral undercut of a structured surface layer

Device and method for etching a substrate using an inductively coupled plasma

Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma out put or adjusting the same upwards

Method of manufacturing micromechanical surface structures by vapor-phase etching

Method of producing micromechanical structures

Method and device for measuring a physical variable

Force sensor and a method for manufacturing a force sensor

Device and method for etching a substrate by using an inductively coupled plasma

Force sensor having an adjustable distance between an operating point and a point of mechanical instability

Method for removing defects from silicon bodies by a selective etching process

Structural body having a stochastic surface patterning as well as a capacitive sensor having such a structural body

Device and method for etching a substrate by using an inductively coupled plasma

(unassigned)

Method for manufacturing a force sensor