Inventor · disambiguated record
Hiromi Shima
Also filed as: SHIMA HIROMI
12 granted patents·5 pending applications·541 citations·filing 1986–2019
89Inventor score
Files withTOKYO ELECTRON LTD11OMRON TATEISI ELECTRONICS CO4FURUYA HARUHIKO1MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1
Top patents by PatentIndex Score
17 records- 0196US9640448B2Film forming method, film forming apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted May 2, 2017·463 cites·8 claims
- 0280US9748065B2Sealed contact deviceOMRON TATEISI ELECTRONICS CO·Filed 2014·Granted Aug 29, 2017·4 cites·12 claims
- 0380US4812712APlasma processing apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1986·Granted Mar 14, 1989·56 cites·10 claims
- 0470US10964530B2Method of forming blocking silicon oxide film, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Mar 30, 2021·1 cites·10 claims
- 0569US10553686B2Method and apparatus for forming silicon oxide film, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Feb 4, 2020·1 cites·16 claims
- 0662US7307499B2High-frequency relayOMRON TATEISI ELECTRONICS CO·Filed 2003·Granted Dec 11, 2007·11 cites·6 claims
- 0756US9758867B2Method of controlling gas supply apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 2014·Granted Sep 12, 2017·0 cites·8 claims
- 0855US9552948B2Sealed contact device and method of manufacturing the sameOMRON TATEISI ELECTRONICS CO·Filed 2014·Granted Jan 24, 2017·0 cites·7 claims
- 0951US9422624B2Heat treatment methodTOKYO ELECTRON LTD·Filed 2015·Granted Aug 23, 2016·0 cites·11 claims
- 1051US2013205611A1Gas supply apparatus and heat treatment apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1149US10781515B2Film-forming method and film-forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Sep 22, 2020·0 cites·11 claims
- 1249US6781489B2High-frequency relayOMRON TATEISI ELECTRONICS CO·Filed 2003·Granted Aug 24, 2004·5 cites·7 claims
- 1342US10968515B2Vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Apr 6, 2021·0 cites·8 claims
- 1442US2015221529A1Gas supply method and thermal treatment methodTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 1540US2015259792A1Method of Forming Titanium Carbonitride Film and Film Formation Apparatus ThereforTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 1639US2012288625A1Gas supply apparatus, thermal treatment apparatus, gas supply method, and thermal treatment methodFURUYA HARUHIKO·Filed 2012·Application pending·0 cites
- 1739US2018135179A1Gas Injector and Vertical Heat Treatment ApparatusTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
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