Inventor · disambiguated record
Jaw-Jung Shin
Also filed as: SHIN JAW-JUNG
43 granted patents·1 pending application·821 citations·filing 2001–2021
98Inventor score
Files withTAIWAN SEMICONDUCTOR MFG27TAIWAN SEMICONDUCTOR MFG CO LTD8WANG WEN CHUAN3Liu pei-yi2SHIN JAW-JUNG2
Top patents by PatentIndex Score
44 records- 0199US8722286B2Devices and methods for improved reflective electron beam lithographyYU CHEN-HUA·Filed 2012·Granted May 13, 2014·82 cites·20 claims
- 0298US8828632B2Multiple-grid exposure methodTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 9, 2014·26 cites·20 claims
- 0398US8762900B2Method for proximity correctionSHIN JAW-JUNG·Filed 2012·Granted Jun 24, 2014·121 cites·13 claims
- 0498US7252909B2Method to reduce CD non-uniformity in IC manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Aug 7, 2007·199 cites·22 claims
- 0597US9810994B2Systems and methods for high-throughput and small-footprint scanning exposure for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 7, 2017·8 cites·20 claims
- 0697US8846278B2Electron beam lithography system and method for improving throughputTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 30, 2014·26 cites·14 claims
- 0797US8822106B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Sep 2, 2014·31 cites·22 claims
- 0897US8584057B2Non-directional dithering methodsLiu pei-yi·Filed 2012·Granted Nov 12, 2013·33 cites·20 claims
- 0997US8510687B1Error diffusion and grid shift in lithographyLiu pei-yi·Filed 2012·Granted Aug 13, 2013·32 cites·20 claims
- 1096US8530121B2Multiple-grid exposure methodWANG WEN CHUAN·Filed 2012·Granted Sep 10, 2013·37 cites·20 claims
- 1196US8524427B2Electron beam lithography system and method for improving throughputSHIN JAW-JUNG·Filed 2011·Granted Sep 3, 2013·30 cites·20 claims
- 1296US7266803B2Layout generation and optimization to improve photolithographic performanceTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Sep 4, 2007·82 cites·30 claims
- 1388US9329488B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted May 3, 2016·2 cites·20 claims
- 1487US8972908B2Method for electron beam proximity correction with improved critical dimension accuracyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Mar 3, 2015·10 cites·20 claims
- 1586US7934177B2Method and system for a pattern layout splitTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Apr 26, 2011·19 cites·22 claims
- 1685US8822107B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 2, 2014·5 cites·25 claims
- 1784US8368037B2Systems and methods providing electron beam writing to a mediumTAIWAN SEMICONDUCTOR MFG·Filed 2011·Granted Feb 5, 2013·4 cites·11 claims
- 1883US7234128B2Method for improving the critical dimension uniformity of patterned features on wafersTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jun 19, 2007·21 cites·38 claims
- 1980US9001308B2Pattern generator for a lithography systemYU CHEN-HUA·Filed 2013·Granted Apr 7, 2015·3 cites·20 claims
- 2079US7643976B2Method and system for identifying lens aberration sensitive patterns in an integrated circuit chipTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jan 5, 2010·6 cites·21 claims
- 2177US9176389B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Nov 3, 2015·2 cites·20 claims
- 2276US9538628B1Method for EUV power improvement with fuel droplet trajectory stabilizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jan 3, 2017·2 cites·17 claims
- 2374US9390891B2Apparatus for charged particle lithography systemTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Jul 12, 2016·2 cites·20 claims
- 2474US6774044B2Reducing photoresist shrinkage via plasma treatmentTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Aug 10, 2004·19 cites·7 claims
- 2571US8610083B2Systems and methods providing electron beam writing to a mediumTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Dec 17, 2013·1 cites·20 claims
- 2670US6973636B2Method of defining forbidden pitches for a lithography exposure toolTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Dec 6, 2005·12 cites·29 claims
- 2766US11670541B2Methods of manufacturing semiconductor device using phase shift maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 6, 2023·0 cites·20 claims
- 2863US9529271B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 27, 2016·0 cites·20 claims
- 2963US8927947B2Systems and methods providing electron beam writing to a mediumTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jan 6, 2015·0 cites·20 claims
- 3061US9678434B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 13, 2017·0 cites·20 claims
- 3161US9229332B2Systems and methods for high-throughput and small-footprint scanning exposure for lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jan 5, 2016·0 cites·25 claims
- 3260US8852849B2Electron beam lithography system and method for improving throughputTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Oct 7, 2014·0 cites·20 claims
- 3358US9519225B2Systems and methods for high-throughput and small-footprint scanning exposure for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Dec 13, 2016·0 cites·20 claims
- 3457US11189521B2Methods of manufacturing redistribution circuit structures using phase shift maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Nov 30, 2021·0 cites·20 claims
- 3557US9911575B2Apparatus for charged particle lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Mar 6, 2018·0 cites·20 claims
- 3655US6861179B1Charge effect and electrostatic damage prevention method on photo-maskTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Mar 1, 2005·4 cites·28 claims
- 3754US9291913B2Pattern generator for a lithography systemTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted Mar 22, 2016·0 cites·20 claims
- 3850US8984452B2Long-range lithographic dose correctionTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Mar 17, 2015·0 cites·20 claims
- 3947US7057299B2Alignment mark configurationTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Jun 6, 2006·2 cites·6 claims
- 4044US9147377B2Method for image dithering for lithographic processesTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 29, 2015·0 cites·20 claims
- 4142US9182660B2Methods for electron beam patterningWANG WEN-CHUAN·Filed 2012·Granted Nov 10, 2015·0 cites·20 claims
- 4242US9134627B2Multiple-patterning overlay decoupling methodWANG WEN-CHUAN·Filed 2011·Granted Sep 15, 2015·0 cites·20 claims
- 4342US2007087291A1Lithography process to reduce interferenceTAIWAN SEMICONDUCTOR MFG·Filed 2005·Application pending·0 cites
- 4438US7175941B2Phase shift assignments for alternate PSMTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Feb 13, 2007·0 cites·38 claims
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