Inventor · disambiguated record
Nien-Ting Ho
Also filed as: HO NIEN-TING
39 granted patents·6 pending applications·93 citations·filing 2007–2025
96Inventor score
Top patents by PatentIndex Score
45 records- 0195US9659937B2Semiconductor process of forming metal gates with different threshold voltages and semiconductor structure thereofUNITED MICROELECTRONICS CORP·Filed 2015·Granted May 23, 2017·14 cites·20 claims
- 0294US9048254B2Semiconductor structure having a metal gate with side wall spacersCHEN YI-WEI·Filed 2009·Granted Jun 2, 2015·22 cites·9 claims
- 0392US8766319B2Semiconductor device with ultra thin silicide layerLAI KUO-CHIH·Filed 2012·Granted Jul 1, 2014·16 cites·2 claims
- 0488US2025015158A1Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2024·Application pending·0 cites
- 0586US8067281B1Method of fabricating complementary metal-oxide-semiconductor (CMOS) DeviceCHEN YI-WEI·Filed 2010·Granted Nov 29, 2011·9 cites·15 claims
- 0684US12237394B2Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2023·Granted Feb 25, 2025·0 cites·7 claims
- 0784US12125890B2Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2023·Granted Oct 22, 2024·0 cites·6 claims
- 0883US9397189B2Semiconductor structure having a metal gate with side wall spacersUNITED MICROELECTRONICS CORP·Filed 2015·Granted Jul 19, 2016·3 cites·14 claims
- 0982US9331161B1Metal gate structure and method of forming the sameUNITED MICROELECTRONICS CORP·Filed 2014·Granted May 3, 2016·6 cites·9 claims
- 1081US8507350B2Fabricating method of semiconductor elementsHUANG CHIEN-CHUNG·Filed 2011·Granted Aug 13, 2013·5 cites·11 claims
- 1179US11757016B2Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2022·Granted Sep 12, 2023·0 cites·13 claims
- 1279US9728467B2Method for modulating work function of semiconductor device having metal gate structure by gas treatmentUNITED MICROELECTRONICS CORP·Filed 2015·Granted Aug 8, 2017·3 cites·18 claims
- 1378US2025159964A1Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2025·Application pending·0 cites
- 1475US8860150B2Metal gate structureLIN CHIN-FU·Filed 2009·Granted Oct 14, 2014·6 cites·9 claims
- 1573US11322598B2Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2020·Granted May 3, 2022·0 cites·7 claims
- 1670US8541303B2Method for fabricating MOS transistorLAI KUO-CHIH·Filed 2011·Granted Sep 24, 2013·2 cites·6 claims
- 1768US11916126B2Semiconductor device and manufacturing method thereofUNITED MICROELECTRONICS CORP·Filed 2022·Granted Feb 27, 2024·0 cites·17 claims
- 1866US11424408B2ReRAM structure and method of fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2021·Granted Aug 23, 2022·0 cites·7 claims
- 1966US8877635B2Method for fabricating MOS transistorUNITED MICROELECTRONICS CORP·Filed 2013·Granted Nov 4, 2014·1 cites·8 claims
- 2066US8815738B2Salicide processHSU CHIA-CHANG·Filed 2012·Granted Aug 26, 2014·3 cites·12 claims
- 2165US11538917B2Semiconductor device and manufacturing method thereofUNITED MICROELECTRONICS CORP·Filed 2021·Granted Dec 27, 2022·0 cites·17 claims
- 2265US10734496B2Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2018·Granted Aug 4, 2020·0 cites·8 claims
- 2365US9478628B1Metal gate forming processUNITED MICROELECTRONICS CORP·Filed 2015·Granted Oct 25, 2016·1 cites·16 claims
- 2464US8163607B2Semiconductor device and method of making the sameCHEN YI-WEI·Filed 2010·Granted Apr 24, 2012·1 cites·8 claims
- 2562US7943512B2Method for fabricating metal silicideUNITED MICROELECTRONICS CORP·Filed 2007·Granted May 17, 2011·1 cites·14 claims
- 2661US12274087B2Field effect transistor and fabrication method thereofUNITED MICROELECTRONICS CORP·Filed 2022·Granted Apr 8, 2025·0 cites·20 claims
- 2761US12211888B2Method for forming a thin film resistor with improved thermal stabilityUNITED MICROELECTRONICS CORP·Filed 2021·Granted Jan 28, 2025·0 cites·9 claims
- 2857US11165019B2ReRAM structure and method of fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2019·Granted Nov 2, 2021·0 cites·9 claims
- 2956US11139384B2Method for fabricating semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2019·Granted Oct 5, 2021·0 cites·8 claims
- 3055US10199228B2Manufacturing method of metal gate structureUNITED MICROELECTRONICS CORP·Filed 2017·Granted Feb 5, 2019·0 cites·8 claims
- 3155US8993390B2Method for fabricating semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2014·Granted Mar 31, 2015·0 cites·16 claims
- 3253US8344465B2Semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2012·Granted Jan 1, 2013·0 cites·3 claims
- 3352US9653300B2Structure of metal gate structure and manufacturing method of the sameUNITED MICROELECTRONICS CORP·Filed 2013·Granted May 16, 2017·0 cites·7 claims
- 3451US9349822B2Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2014·Granted May 24, 2016·0 cites·17 claims
- 3547US10490643B2Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2015·Granted Nov 26, 2019·0 cites·10 claims
- 3646US8883650B2Method of removing oxidesLAI KUO-CHIH·Filed 2008·Granted Nov 11, 2014·0 cites·18 claims
- 3746US7803702B2Method for fabricating MOS transistorsUNITED MICROELECTRONICS CORP·Filed 2008·Granted Sep 28, 2010·0 cites·14 claims
- 3845US9305847B2Method of manufacturing semiconductor device having gate metalUNITED MICROELECTRONICS CORP·Filed 2014·Granted Apr 5, 2016·0 cites·10 claims
- 3945US7670438B2Method of removing particles from waferUNITED MICROELECTRONICS CORP·Filed 2007·Granted Mar 2, 2010·0 cites·20 claims
- 4043US9691704B1Semiconductor structure and method for manufacturing the sameUNITED MICROELECTRONICS CORP·Filed 2016·Granted Jun 27, 2017·0 cites·15 claims
- 4141US2015061042A1Metal gate structure and method of fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2013·Application pending·0 cites
- 4240US2014239419A1Semiconductor device and method of manufacturing the sameUNITED MICROELECTRONICS CORP·Filed 2013·Application pending·0 cites
- 4339US9576803B2Method for tuning metal gate work function before contact formation in fin-shaped field effect transistor manufacturing processUNITED MICROELECTRONICS CORP·Filed 2015·Granted Feb 21, 2017·0 cites·9 claims
- 4436US2012088345A1Method of forming silicide for contact plugsCHEN YI-WEI·Filed 2010·Application pending·0 cites
- 4531US2012122288A1Method of fabricating a silicide layerHSIEH CHAO-CHING·Filed 2010·Application pending·0 cites
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