Inventor · disambiguated record
Naoshi Itabashi
Also filed as: ITABASHI NAOSHI
28 granted patents·28 pending applications·229 citations·filing 1995–2021
96Inventor score
Top patents by PatentIndex Score
56 records- 0192US8546266B2Plasma processing method and plasma processing apparatusMORI MASAHITO·Filed 2011·Granted Oct 1, 2013·12 cites·5 claims
- 0291US5891252APlasma processing apparatusHITACHI LTD·Filed 1996·Granted Apr 6, 1999·60 cites·30 claims
- 0389US7396771B2Plasma etching apparatus and plasma etching methodHITACHI HIGH TECH CORP·Filed 2006·Granted Jul 8, 2008·15 cites·4 claims
- 0486US6033481APlasma processing apparatusHITACHI LTD·Filed 1999·Granted Mar 7, 2000·41 cites·23 claims
- 0585US7931776B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Apr 26, 2011·8 cites·7 claims
- 0682US8129283B2Plasma processing method and plasma processing apparatusMORI MASAHITO·Filed 2008·Granted Mar 6, 2012·6 cites·4 claims
- 0781US9076637B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2013·Granted Jul 7, 2015·3 cites·4 claims
- 0878US7908104B2Plasma processing apparatus and method for detecting status of said apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Mar 15, 2011·4 cites·12 claims
- 0977US5714757ASurface analyzing method and its apparatusHITACHI LTD·Filed 1995·Granted Feb 3, 1998·32 cites·32 claims
- 1075US9702695B2Image processing device, charged particle beam device, charged particle beam device adjustment sample, and manufacturing method thereofKAWADA HIROKI·Filed 2011·Granted Jul 11, 2017·5 cites·7 claims
- 1174US7601241B2Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 2004·Granted Oct 13, 2009·9 cites·11 claims
- 1273US8926790B2Plasma processing apparatusTETSUKA TSUTOMU·Filed 2006·Granted Jan 6, 2015·3 cites·8 claims
- 1373US8282767B2Plasma processing apparatusITABASHI NAOSHI·Filed 2011·Granted Oct 9, 2012·3 cites·2 claims
- 1472US9034270B2Plasma sterilization and cleaning treatment device for escalator, and escalator using the sameKOBAYASHI HIROYUKI·Filed 2012·Granted May 19, 2015·4 cites·20 claims
- 1572US6673685B2Method of manufacturing semiconductor devicesHITACHI LTD·Filed 2002·Granted Jan 6, 2004·15 cites·4 claims
- 1671US9997337B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Jun 12, 2018·1 cites·4 claims
- 1765US7771607B2Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 2007·Granted Aug 10, 2010·1 cites·1 claims
- 1860US7442651B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2006·Granted Oct 28, 2008·2 cites·8 claims
- 1956US2009165951A1Plasma processing apparatus capable of suppressing variation of processing characteristicsITABASHI NAOSHI·Filed 2009·Application pending·0 cites
- 2054US2021316310A1Droplet transport device, analysis system, and analysis methodHITACHI HIGH TECH CORP·Filed 2021·Application pending·0 cites
- 2153US10481125B2Biomolecule measuring deviceHITACHI HIGH TECH CORP·Filed 2014·Granted Nov 19, 2019·0 cites·12 claims
- 2253US2009152241A1Plasma etching apparatus and plasma etching methodMIYA GO·Filed 2009·Application pending·0 cites
- 2352US8865403B2Nucleic acid analyzing device and nucleic acid analyzerNARAHARA MASATOSHI·Filed 2009·Granted Oct 21, 2014·0 cites·9 claims
- 2452US2008257863A1Plasma processing apparatus and method for stabilizing inner wall of processing chamberKITSUNAI HIROYUKI·Filed 2007·Application pending·0 cites
- 2551US9759681B2Biomolecule detection method, biomolecule detection device and analysis deviceHITACHI HIGH TECH CORP·Filed 2013·Granted Sep 12, 2017·0 cites·5 claims
- 2651US7604709B2Plasma processing apparatusHITACHI LTD·Filed 2002·Granted Oct 20, 2009·3 cites·42 claims
- 2750US2021348227A1Substrate for nucleic acid analysis, flow cell for nucleic acid analysis, and image analysis methodHITACHI HIGH TECH CORP·Filed 2019·Application pending·0 cites
- 2850US2022214326A1Biopolymer analysis device, biopolymer analysis equipment, and biopolymer analysis methodHITACHI HIGH TECH CORP·Filed 2019·Application pending·0 cites
- 2949US6797112B2Plasma treatment apparatus and method of producing semiconductor device using the apparatusHITACHI LTD·Filed 2003·Granted Sep 28, 2004·2 cites·7 claims
- 3049US2006096706A1Dry etching apparatus and a method of manufacturing a semiconductor deviceHITACHI LTD·Filed 2005·Application pending·0 cites
- 3149US2010282414A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2010·Application pending·0 cites
- 3249US2008110569A1Plasma etching apparatus and plasma etching methodMIYA GO·Filed 2007·Application pending·0 cites
- 3348US2010258529A1Plasma Processing Apparatus and Plasma Processing MethodMORI MASAHITO·Filed 2009·Application pending·0 cites
- 3447US2014162351A1Culturing sheet, culturing equipment material and manufacturing methodYAMAMOTO JIRO·Filed 2011·Application pending·0 cites
- 3546US10451584B2Biomolecule measuring deviceHITACHI HIGH TECH CORP·Filed 2013·Granted Oct 22, 2019·0 cites·14 claims
- 3646US10031083B2Fixed position controller and methodHITACHI HIGH TECH CORP·Filed 2014·Granted Jul 24, 2018·0 cites·15 claims
- 3746US9293300B2Plasma processing apparatusHITACHI LTD·Filed 2012·Granted Mar 22, 2016·0 cites·14 claims
- 3846US2005087297A1Plasma processing apparatus and method for stabilizing inner wall of processing chamberFiled 2004·Application pending·0 cites
- 3945US2013323839A1Culture Substrate and Culture SheetTAKAHASHI RYOSUKE·Filed 2010·Application pending·0 cites
- 4043US2020102587A1Nucleic acid amplification method and nucleic acid analyzerHITACHI HIGH TECH CORP·Filed 2017·Application pending·0 cites
- 4142US11130985B2Spot array substrate, method for producing same, and nucleic acid polymer analysis method and deviceHITACHI HIGH TECH CORP·Filed 2015·Granted Sep 28, 2021·0 cites·9 claims
- 4242US2015010902A1Apparatus and Method for Monitoring Airborne Microorganisms in the AtmosphereTAKENAKA KEI·Filed 2012·Application pending·0 cites
- 4342US2007209759A1Plasma etching apparatus and plasma etching methodMIYA GO·Filed 2006·Application pending·0 cites
- 4441US2006032584A1Plasma processing apparatus capable of suppressing variation of processing characteristicsITABASHI NAOSHI·Filed 2004·Application pending·0 cites
- 4541US2014243214A1Fet array substrate, analysis system and methodHITACHI LTD·Filed 2013·Application pending·0 cites
- 4641US2012132368A1Plasma treatment apparatusKOBAYASHI HIROYUKI·Filed 2011·Application pending·0 cites
- 4739US11181502B2Hole formation method and measurement deviceHITACHI HIGH TECH CORP·Filed 2015·Granted Nov 23, 2021·0 cites·3 claims
- 4839US2005072444A1Method for processing plasma processing apparatusFiled 2004·Application pending·0 cites
- 4939US2002129904A1Plasma treatment apparatus and method of producing semiconductor device using the apparatusHITACHI LTD·Filed 2001·Application pending·0 cites
- 5038US2004038436A1Method of manufacturing a semiconductor integrated circuit deviceHITACHI LTD·Filed 2002·Application pending·0 cites
Showing the top 50 of 56 patent records by PatentIndex Score.
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