Inventor · disambiguated record
Yoko Y. Adams
Also filed as: ADAMS YOKO Y · ADAMS YOKO YAMAGUCHI
4 granted patents·1 pending application·23 citations·filing 2004–2012
73Inventor score
Technology areasH10P
Top patents by PatentIndex Score
5 records- 0183US7491343B2Line end shortening reduction during etchLAM RES CORP·Filed 2007·Granted Feb 17, 2009·10 cites·17 claims
- 0264US8298958B2Organic line width roughness with H2 plasma treatmentADAMS YOKO Y·Filed 2008·Granted Oct 30, 2012·3 cites·16 claims
- 0357US7682985B2Dual doped polysilicon and silicon germanium etchLAM RES CORP·Filed 2004·Granted Mar 23, 2010·7 cites·14 claims
- 0449US7316785B2Methods and apparatus for the optimization of etch resistance in a plasma processing systemLAM RES CORP·Filed 2004·Granted Jan 8, 2008·3 cites·25 claims
- 0546US2013087284A1Organic line width roughness with h2 plasma treatmentLAM RES CORP·Filed 2012·Application pending·0 cites
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