Inventor · disambiguated record
Shin Utsunomiya
Also filed as: UTSUNOMIYA SHIN · UTSUNOMIYA SHIN-ICHI
8 granted patents·4 pending applications·65 citations·filing 1978–2014
84Inventor score
Files withMITSUBISHI ELECTRIC CORP2TOYO GOSEI CO LTD2AGENCY IND SCIENCE TECHN1FUJITSU LTD1JANG WON B1
Top patents by PatentIndex Score
12 records- 0175US7348128B2Photosensitive resin based on saponified polyvinyl acetate photosensitive resin composition, method of forming aqueous gel from the same, and compoundTOYO GOSEI CO LTD·Filed 2003·Granted Mar 25, 2008·16 cites·10 claims
- 0265US7818479B2Interface apparatus and packet transfer methodTOSHIBA STORAGE DEVICE CORP·Filed 2004·Granted Oct 19, 2010·15 cites·12 claims
- 0358US4228944AMethod of bonding substrates made of metal or alloyMITSUBISHI ELECTRIC CORP·Filed 1978·Granted Oct 21, 1980·13 cites·9 claims
- 0456US4886108AMethod for forming a fiber-reinforced metal sheetAGENCY IND SCIENCE TECHN·Filed 1988·Granted Dec 12, 1989·14 cites·7 claims
- 0549US9601090B2Graph display processing systemSHIMADZU CORP·Filed 2013·Granted Mar 21, 2017·0 cites·12 claims
- 0643US2016272746A1Photocurable Composition and Molded ArticleSOKEN KAGAKU KK·Filed 2014·Application pending·0 cites
- 0742US2006084736A1Thermosetting one-solution type composition for protective film of color filter and color filter using the sameJANG WON B·Filed 2005·Application pending·0 cites
- 0842US2003131166A1Information processing system and interface apparatusFUJITSU LTD·Filed 2002·Application pending·0 cites
- 0937US7408002B2Photosensitive resin composition and process for the formation of hydrogelTOYO GOSEI CO LTD·Filed 2003·Granted Aug 5, 2008·0 cites·4 claims
- 1034US6797452B2Photosensitive composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the compositionTOYO GOSEI KOGYO KK·Filed 2002·Granted Sep 28, 2004·2 cites·10 claims
- 1134US5413981AOxide superconductor and a method for manufacturing an oxide superconductorMITSUBISHI ELECTRIC CORP·Filed 1993·Granted May 9, 1995·5 cites·3 claims
- 1227US2001021750A1Polymer compound, method of producing the same, photosensitive composition, and pattern formation methodFiled 2001·Application pending·0 cites
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