Inventor · disambiguated record
Eberhard Kuhn
Also filed as: KUEHN EBERHARD · KUHN EBERHARD
25 granted patents·809 citations·filing 1975–2003
97Inventor score
Top patents by PatentIndex Score
25 records- 0197US4339521AHeat resistant positive resists containing polyoxazolesSIEMENS AG·Filed 1980·Granted Jul 13, 1982·121 cites·7 claims
- 0296US6893972B2Process for sidewall amplification of resist structures and for the production of structures having reduced structure sizeINFINEON TECHNOLOGIES AG·Filed 2002·Granted May 17, 2005·280 cites·12 claims
- 0396US4395482AMethod for the preparation of heat-resistant relief structures using positive resistsSIEMENS AG·Filed 1982·Granted Jul 26, 1983·86 cites·7 claims
- 0492US4329556AN-Azidosulfonylaryl-maleinimidesSIEMENS AG·Filed 1980·Granted May 11, 1982·25 cites·2 claims
- 0591US4040831AMethod for the preparation of relief structuresSIEMENS AG·Filed 1975·Granted Aug 9, 1977·49 cites·7 claims
- 0684US4371685ARadiation-reactive precursor stages of highly heat-resistant polymersSIEMENS AG·Filed 1981·Granted Feb 1, 1983·33 cites·17 claims
- 0781US5486447ANegative resists with high thermal stability comprising end capped polybenzoxazole and bisazideSIEMENS AG·Filed 1994·Granted Jan 23, 1996·37 cites·6 claims
- 0872US4311785AMethod for the preparation of highly heat-resistant relief structures and the use thereofSIEMENS AG·Filed 1980·Granted Jan 19, 1982·27 cites·9 claims
- 0969US4287294AMethod for the preparation of relief structures by phototechniquesSIEMENS AG·Filed 1980·Granted Sep 1, 1981·24 cites·6 claims
- 1068US4654415AMethod for the preparation of polyimide and polyisoindoloquinazoline dione precursorsSIEMENS AG·Filed 1985·Granted Mar 31, 1987·18 cites·10 claims
- 1165US4385165APolyimide, polyisoindoloquinazoline dione, polyoxazine dione and polyquinazoline dione precursor stages and the manufactureSIEMENS AG·Filed 1980·Granted May 24, 1983·17 cites·13 claims
- 1262US6770423B2Negative resist process with simultaneous development and silylationINFINEON TECHNOLOGIES AG·Filed 2002·Granted Aug 3, 2004·7 cites·8 claims
- 1351US7052820B2Silicon-containing resist for photolithographyINFINEON TECHNOLOGIES AG·Filed 2002·Granted May 30, 2006·3 cites·10 claims
- 1451US4397999APolyimidazole and polyimidazopyrrolone precursor stages and the preparation thereofSIEMENS AG·Filed 1980·Granted Aug 9, 1983·10 cites·5 claims
- 1549US4332883AMethod for the manufacture of highly heat-resistant relief structuresSIEMENS AG·Filed 1980·Granted Jun 1, 1982·9 cites·8 claims
- 1649US4045223AMethod for the preparation of layer structuresSIEMENS AG·Filed 1975·Granted Aug 30, 1977·9 cites·14 claims
- 1747US6946236B2Negative resist process with simultaneous development and aromatization of resist structuresINFINEON TECHNOLOGIES AG·Filed 2002·Granted Sep 20, 2005·2 cites·8 claims
- 1846US4366230AMethod for the preparation of highly heat-resistant relief structures and the use thereofSIEMENS AG·Filed 1981·Granted Dec 28, 1982·8 cites·11 claims
- 1942US4398009APolyoxazole precursor and the preparation thereofSIEMENS AG·Filed 1980·Granted Aug 9, 1983·6 cites·6 claims
- 2042US4292398AMethod for the preparation of relief structures by phototechniquesSIEMENS AG·Filed 1980·Granted Sep 29, 1981·7 cites·7 claims
- 2141US4332882AMethod for the preparation of highly heat-resistant reliefSIEMENS AG·Filed 1980·Granted Jun 1, 1982·6 cites·7 claims
- 2241US4088489AMethod for the preparation of relief structuresSIEMENS AG·Filed 1975·Granted May 9, 1978·6 cites·4 claims
- 2340US5281335AProcess, installation and reactor for biological treatment of waste waterKUHN EBERHARD·Filed 1990·Granted Jan 25, 1994·13 cites·15 claims
- 2439US5733706ADry-developable positive resistSIEMENS AG·Filed 1995·Granted Mar 31, 1998·6 cites·20 claims
- 2535US7018784B2Process for increasing the etch resistance and for reducing the hole and trench width of a photoresist structure using solvent systems of low polarityINFINEON TECHNOLOGIES AG·Filed 2003·Granted Mar 28, 2006·0 cites·19 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →