Inventor · disambiguated record
Shogo Matsumaru
Also filed as: MATSUMARU SHOGO
12 granted patents·1 pending application·116 citations·filing 2004–2016
88Inventor score
Top patents by PatentIndex Score
13 records- 0196US7482108B2Polymer compound, acid generator, positive resist composition, and method for formation of resist patternsTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jan 27, 2009·92 cites·18 claims
- 0292US10101658B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Oct 16, 2018·6 cites·20 claims
- 0379US10324377B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Jun 18, 2019·2 cites·8 claims
- 0476US8034536B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Oct 11, 2011·4 cites·8 claims
- 0574US7829259B2Resin for photoresist composition, photoresist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Nov 9, 2010·2 cites·9 claims
- 0670US7932013B2Pattern coating material and pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Apr 26, 2011·3 cites·7 claims
- 0762US7592123B2Resin for photoresist composition, photoresist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Sep 22, 2009·5 cites·11 claims
- 0851US7943284B2Compound, dissolution inhibitor, positive type resist composition, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted May 17, 2011·0 cites·5 claims
- 0949US8304163B2Compound, dissolution inhibitor, positive type resist composition, and method of forming resist patternSHIONO DAIJU·Filed 2010·Granted Nov 6, 2012·0 cites·1 claims
- 1047US7851127B2Polymer compound, positive resist composition and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Dec 14, 2010·2 cites·9 claims
- 1146US8349543B2Pattern-forming method, metal oxide film-forming material and method for using the metal oxide film-forming materialTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Jan 8, 2013·0 cites·6 claims
- 1239US2010028799A1Resist composition for immersion exposure and method for resist pattern formationTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
- 1334US8101013B2Film-forming material and method of forming patternMATSUMARU SHOGO·Filed 2006·Granted Jan 24, 2012·0 cites·6 claims
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