Inventor · disambiguated record
In-Kyun Shin
Also filed as: SHIN IN-KYUN
18 granted patents·9 pending applications·111 citations·filing 1996–2024
92Inventor score
Top patents by PatentIndex Score
27 records- 0197US10012900B2Method of correcting mask pattern and method of manufacturing reticleSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jul 3, 2018·12 cites·15 claims
- 0293US9671686B2Exposure methods using e-beams and methods of manufacturing masks and semiconductor devices therefromCHOI JIN·Filed 2015·Granted Jun 6, 2017·8 cites·7 claims
- 0378US5741613AMethods of forming half-tone phase-shift masks with reduced susceptiblity to parasitic sputteringSAMSUNG ELECTRONICS CO LTD·Filed 1996·Granted Apr 21, 1998·44 cites·14 claims
- 0476US7389491B2Methods, systems and computer program products for correcting photomask using aerial images and boundary regionsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 17, 2008·5 cites·19 claims
- 0567US2024345473A1Blank mask and method of fabricating the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 0666US2024248390A1Apparatus for fabricating blank mask and method of fabricating the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 0764US6866968B2Photomask for off-axis illumination and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Mar 15, 2005·9 cites·30 claims
- 0853US5853921AMethods of fabricating phase shift masks by controlling exposure dosesSAMSUNG ELECTRONICS CO LTD·Filed 1997·Granted Dec 29, 1998·15 cites·20 claims
- 0952US7112390B2Method of manufacturing chromeless phase shift maskSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Sep 26, 2006·5 cites·10 claims
- 1051US7338736B2Method of fabricating a phase shift maskSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Mar 4, 2008·4 cites·12 claims
- 1150US7541118B2Phase shift maskSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Jun 2, 2009·0 cites·17 claims
- 1249US7432022B2Photo mask capable of improving resolution by utilizing polarization of light and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Oct 7, 2008·4 cites·13 claims
- 1346US7387965B2Reference pattern for creating a defect recognition level, method of fabricating the same and method of inspecting defects using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jun 17, 2008·1 cites·32 claims
- 1443US7335449B2Masks each having a central main pattern region and a peripheral phantom pattern region with light-transmitting features in both pattern regions having the shame shape and pitch and methods of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Feb 26, 2008·1 cites·12 claims
- 1542US6919149B2Wave guided alternating phase shift mask and fabrication method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jul 19, 2005·1 cites·16 claims
- 1640US2013250286A1Apparatus for measuring patterns on a reflective photomaskHAN HAK-SEUNG·Filed 2012·Application pending·0 cites
- 1739US7595136B2Method of fabricating chrome-less phase shift maskSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Sep 29, 2009·0 cites·21 claims
- 1838US8795929B2Pellicle having buffer zone and photomask structure having pellicleKIM SUNG-HYUCK·Filed 2012·Granted Aug 5, 2014·0 cites·17 claims
- 1938US2013251238A1Methods of aligning objects and apparatuses for performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2012·Application pending·0 cites
- 2036US9583305B2Exposure method using control of settling times and methods of manufacturing integrated circuit devices by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Feb 28, 2017·0 cites·20 claims
- 2136US2005123845A1Method of adjusting deviation of critical dimension of patternsFiled 2005·Application pending·0 cites
- 2234US7100322B2Method of manufacturing an alternating phase shift maskSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Sep 5, 2006·0 cites·6 claims
- 2333US2004091792A1Phase edge phase shift mask and method for fabricating the sameFiled 2003·Application pending·0 cites
- 2432US2011169495A1Monitoring module including e-field-induced esd-sensitive pattern and photomask including the moduleLEE SU-YOUNG·Filed 2010·Application pending·0 cites
- 2531US5814424AHalf tone phase shift masks with staircase regions and methods of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 1997·Granted Sep 29, 1998·2 cites·17 claims
- 2630US2006019176A1Chromeless phase shift mask and method of fabricating the sameKIM SUNG-HYUCK·Filed 2005·Application pending·0 cites
- 2726US2010209826A1Apparatus for processing photomask, methods of using the same, and methods of processing photomaskKIM SUNG-HYUCK·Filed 2010·Application pending·0 cites
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