Inventor · disambiguated record
Won-Tai Ki
Also filed as: KI WON-TAI
10 granted patents·172 citations·filing 2001–2004
89Inventor score
Files withSAMSUNG ELECTRONICS CO LTD10
Top patents by PatentIndex Score
10 records- 0191US6291119B2Method of compensating for pattern dimension variation caused by re-scattered electron beam in electron beam lithography and recording medium in which the method is recordedSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Sep 18, 2001·76 cites·12 claims
- 0289US7129024B2Electron beam lithography methodSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Oct 31, 2006·36 cites·13 claims
- 0378US6835507B2Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flareSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Dec 28, 2004·19 cites·21 claims
- 0475US6475684B2Method of correcting line width variation due to loading effect caused during etching of a photomask and recording medium formed according to the methodSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Nov 5, 2002·20 cites·15 claims
- 0572US6775815B2Exposure method for correcting line width variation in a photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Aug 10, 2004·14 cites·10 claims
- 0649US7185312B2Exposure method for correcting line width variation in a photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Feb 27, 2007·2 cites·8 claims
- 0747US7393615B2Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flareSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jul 1, 2008·2 cites·7 claims
- 0846US7065735B2Method for making an OPC mask and an OPC mask manufactured using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 20, 2006·1 cites·22 claims
- 0945US6689520B2Exposure method for correcting dimension variation in electron beam lithographySAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Feb 10, 2004·1 cites·16 claims
- 1045US6617084B2Electron beam mask having dummy stripe(s) and lithographic method of manufacturing a semiconductor device using an E-beam mask having at least one defective patternSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Sep 9, 2003·1 cites·27 claims
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