Inventor · disambiguated record
Koichiro Narimatsu
Also filed as: NARIMATSU KOICHIRO
14 granted patents·214 citations·filing 1995–2019
92Inventor score
Top patents by PatentIndex Score
14 records- 0195US6323560B1Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photo mask and method of exposure thereofMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Nov 27, 2001·63 cites·3 claims
- 0281US6114072AReticle having interlocking dicing regions containing monitor marks and exposure method and apparatus utilizing sameMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Sep 5, 2000·47 cites·9 claims
- 0375US6849957B2Photomask including auxiliary mark area, semiconductor device and manufacturing method thereofRENESAS TECH CORP·Filed 2000·Granted Feb 1, 2005·22 cites·4 claims
- 0469US5646452ARegistration accuracy measurement mark for semiconductor devicesMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Jul 8, 1997·34 cites·7 claims
- 0559US5892291ARegistration accuracy measurement markMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Apr 6, 1999·15 cites·12 claims
- 0656US11809156B2Thermal displacement correction method for machine toolDMG MORI CO LTD·Filed 2019·Granted Nov 7, 2023·0 cites·8 claims
- 0755US6596603B1Semiconductor device and manufacturing method thereof, and registration accuracy measurement enhancement methodMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Jul 22, 2003·6 cites·2 claims
- 0849US6667505B2Semiconductor device having a plurality of capacitors aligned at regular intervalsMITSUBISHI ELECTRIC CORP·Filed 2002·Granted Dec 23, 2003·4 cites·6 claims
- 0946US12117795B2Fluctuation amount estimation device in machine tool and correction amount calculation deviceDMG MORI CO LTD·Filed 2019·Granted Oct 15, 2024·0 cites·16 claims
- 1046US6943458B2Semiconductor device and manufacturing method thereof, and registration accuracy measurement enhancement methodRENESAS TECH CORP·Filed 2003·Granted Sep 13, 2005·2 cites·11 claims
- 1144US6607992B2Antireflection coating and semiconductor device manufacturing methodMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Aug 19, 2003·1 cites·9 claims
- 1241US5991007AStep and scan exposure system and semiconductor device manufactured using said systemMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Nov 23, 1999·9 cites·10 claims
- 1339US6068952ARegistration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photomask and method of exposure thereofMITSUBISHI ELECTRIC CORP·Filed 1999·Granted May 30, 2000·4 cites·4 claims
- 1438US5869906ARegistration accuracy measurement mark for semiconductor devicesMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Feb 9, 1999·7 cites·7 claims
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