Inventor · disambiguated record
Walter Spiess
Also filed as: SPIESS WALTER
18 granted patents·245 citations·filing 1991–2003
95Inventor score
Top patents by PatentIndex Score
18 records- 0184US5716756ASulfonic acid esters, radiation-sensitive mixtures prepared therewith and their useHOECHST AG·Filed 1993·Granted Feb 10, 1998·29 cites·17 claims
- 0279US5356752ACompounds with acid-labile protective groups useful in positive-working radiation-sensitive mixturesHOECHST AG·Filed 1992·Granted Oct 18, 1994·17 cites·17 claims
- 0375US5498506APositive-acting radiation-sensitive mixture and recording material produced therewithHOECHST AG·Filed 1993·Granted Mar 12, 1996·32 cites·19 claims
- 0475US5286867ASubstituted 1-sulfonyloxy-2-pyridones and process for preparing themHOECHST AG·Filed 1992·Granted Feb 15, 1994·16 cites·19 claims
- 0568US5230985ANegative-working radiation-sensitive mixtures, and radiation-sensitive recording material produced with these mixturesHOECHST AG·Filed 1992·Granted Jul 27, 1993·22 cites·20 claims
- 0666US5424166ANegative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfromHOECHST AG·Filed 1994·Granted Jun 13, 1995·21 cites·26 claims
- 0765US5286602AAcid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixtureHOECHST AG·Filed 1992·Granted Feb 15, 1994·8 cites·20 claims
- 0864US5364734APostive-working radiation-sensitive mixture and radiation-sensitive recording material produced therewithHOECHST AG·Filed 1992·Granted Nov 15, 1994·19 cites·21 claims
- 0963US7431858B2Nanoimprint resistAZ ELECTRONIC MATERIALS D GMBH·Filed 2003·Granted Oct 7, 2008·9 cites·17 claims
- 1062US5401608ANegative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewithHOECHST AG·Filed 1992·Granted Mar 28, 1995·17 cites·19 claims
- 1161US5229254APositive-working radiation-sensitive mixtures, and radiation-sensitive recording materials produced with these mixturesHOECHST AG·Filed 1992·Granted Jul 20, 1993·17 cites·20 claims
- 1260US5346806AAcid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixtureHOECHST AG·Filed 1992·Granted Sep 13, 1994·7 cites·20 claims
- 1353US5346804AAcid-cleavable radiation-sensitive compounds, positive working radiation-sensitive mixture containing theses compounds, and radiation-sensitive recording material produced with this mixtureHOECHST AG·Filed 1992·Granted Sep 13, 1994·6 cites·19 claims
- 1446US5612164APositive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenoneHOECHST CELANESE CORP·Filed 1995·Granted Mar 18, 1997·11 cites·13 claims
- 1543US5298364ARadiation-sensitive sulfonic acid esters and their useHOECHST AG·Filed 1992·Granted Mar 29, 1994·6 cites·15 claims
- 1642US5256517APositive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having α-β-keto ester units and sulfonate unitsHOECHST AG·Filed 1991·Granted Oct 26, 1993·6 cites·59 claims
- 1735US6063545ANegative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixtureCLARIANT GMBH·Filed 1992·Granted May 16, 2000·1 cites·21 claims
- 1830US5442061ARadiation-sensitive sulfonic acid esters and their useHOECHST AG·Filed 1993·Granted Aug 15, 1995·1 cites·11 claims
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