Inventor · disambiguated record
Takateru Asano
Also filed as: ASANO TAKATERU
8 granted patents·85 citations·filing 1975–1998
87Inventor score
Files withOKI ELECTRIC IND CO LTD4FUJI CHEM IND CO LTD2AGENCY IND SCIENCE TECHN1FUJI CHEMICALS IND COMPANY LIM1
Top patents by PatentIndex Score
8 records- 0165US4588669APhotosensitive lithographic plate with diazo resin underlayer and polyvinyl acetal resin with azide in side chain overlayerFUJI CHEM IND CO LTD·Filed 1984·Granted May 13, 1986·18 cites·8 claims
- 0263US4889795AProcess for forming photoresist pattern using contrast enhancement layer with abietic acidOKI ELECTRIC IND CO LTD·Filed 1988·Granted Dec 26, 1989·18 cites·16 claims
- 0362US4801518AMethod of forming a photoresist patternOKI ELECTRIC IND CO LTD·Filed 1987·Granted Jan 31, 1989·15 cites·6 claims
- 0449US4097283AWater-soluble composition admixture of copolymer having ethylenic unsaturation in side chain and anthraquinone photosensitizerFUJI CHEMICALS IND COMPANY LIM·Filed 1975·Granted Jun 27, 1978·8 cites·7 claims
- 0548US5128231ANegative photoresist composition comprising a photosensitizer of a polyhalogen compoundOKI ELECTRIC IND CO LTD·Filed 1991·Granted Jul 7, 1992·10 cites·8 claims
- 0644US5948592AWater-soluble photoresist compositionFUJI CHEM IND CO LTD·Filed 1998·Granted Sep 7, 1999·10 cites·3 claims
- 0736US4845143APattern-forming materialOKI ELECTRIC IND CO LTD·Filed 1988·Granted Jul 4, 1989·3 cites·10 claims
- 0830US4560640APhotosensitive high polymer, easily insolubilized when cross-linked by light, a method for preparation thereof, and a composition thereofAGENCY IND SCIENCE TECHN·Filed 1984·Granted Dec 24, 1985·3 cites·10 claims
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