Inventor · disambiguated record
Jun Ooyabu
Also filed as: OOYABU JUN
12 granted patents·3 pending applications·572 citations·filing 1997–2011
93Inventor score
Top patents by PatentIndex Score
15 records- 0198US6072147APlasma processing systemTOKYO ELECTRON LTD·Filed 1997·Granted Jun 6, 2000·261 cites·5 claims
- 0293US6723202B2Worktable device and plasma processing apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2001·Granted Apr 20, 2004·124 cites·16 claims
- 0390US6426477B1Plasma processing method and apparatus for eliminating damages in a plasma process of a substrateTOKYO ELECTRON LTD·Filed 2000·Granted Jul 30, 2002·32 cites·16 claims
- 0489US6576860B2Plasma processing method and apparatus for eliminating damages in a plasma process of a substrateTOKYO ELECTRON LTD·Filed 2002·Granted Jun 10, 2003·28 cites·6 claims
- 0588US7506610B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Mar 24, 2009·15 cites·16 claims
- 0686US7494561B2Plasma processing apparatus and method, and electrode plate for plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Feb 24, 2009·12 cites·32 claims
- 0785US7658816B2Focus ring and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Feb 9, 2010·36 cites·8 claims
- 0884US7882800B2Ring mechanism, and plasma processing device using the ring mechanismTOKYO ELECTRON LTD·Filed 2002·Granted Feb 8, 2011·31 cites·32 claims
- 0977US8512510B2Plasma processing method and apparatusKOSHIISHI AKIRA·Filed 2011·Granted Aug 20, 2013·3 cites·17 claims
- 1072USD412513SUpper electrode for manufacturing semiconductorsTOKYO ELECTRON LTD·Filed 1997·Granted Aug 3, 1999·17 cites·1 claims
- 1168US7481240B2Partial pressure control system, flow rate control system and shower plate used for partial pressure control systemTOKYO ELECTRON LTD·Filed 2004·Granted Jan 27, 2009·10 cites·7 claims
- 1266US8109288B2Flow rate control system and shower plate used for partial pressure control systemNAGAOKA HIDEKI·Filed 2008·Granted Feb 7, 2012·3 cites·15 claims
- 1357US2010043974A1Plasma processing method and apparatusKOSHIISHI AKIRA·Filed 2009·Application pending·0 cites
- 1449US2006000803A1Plasma processing method and apparatusKOSHIISHI AKIRA·Filed 2005·Application pending·0 cites
- 1538US2005106869A1Plasma processing apparatusFiled 2003·Application pending·0 cites
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