Inventor · disambiguated record
Takahiro Sakatsume
Also filed as: SAKATSUME Takahiro
1 granted patent·12 pending applications·0 citations·filing 2021–2023
11Inventor score
Technology areasH10P
Files withSHINETSU CHEMICAL CO13
Top patents by PatentIndex Score
13 records- 0151US12247285B2Film-forming method and raw material solutionSHINETSU CHEMICAL CO·Filed 2021·Granted Mar 11, 2025·0 cites·5 claims
- 0250US2025133797A1Crystalline oxide film, laminated structure, semiconductor device, and method for producing crystalline oxide filmSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 0348US2024395548A1Film-forming method, film-forming apparatus, and crystalline oxide filmSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 0448US2025354260A1Film forming method and film forming apparatusSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 0548US2024250185A1Laminated structure, semiconductor device, and method of forming crystalline oxide filmSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 0647US2024124974A1Method of producing raw material solution, method of film-forming and production lotSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 0746US2024250115A1Laminated structure, semiconductor device and method for manufacturing laminated structureSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 0843US2023253203A1Method for producing doping raw-material solution for film formation, method for producing laminate, doping raw-material solution for film formation, and semiconductor filmSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
- 0943US2024229236A9Film-forming apparatus, film-forming method, gallium oxide film and laminateSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 1035US2024425982A1Film forming apparatus and film forming method, and oxide semiconductor film and laminateSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 1135US2024401195A1Film-forming apparatus and manufacturing methodSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 1234US2024234138A9Oxide semiconductor film and film-forming method the same, semiconductor apparatusSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 1330US2023151485A1Film forming apparatus and film forming methodSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →