Inventor · disambiguated record
Sia Kim Tan
Also filed as: TAN SIA K · TAN SIA KIM
22 granted patents·1 pending application·53 citations·filing 2003–2014
93Inventor score
Files withCHARTERED SEMICONDUCTOR MFG15GLOBALFOUNDRIES SG PTE LTD3TAN SIA KIM2GLOBAL FOUNDRIES SINGAPORE PTE LTD1TAN SIA K1
Top patents by PatentIndex Score
23 records- 0186US7560199B2Polarizing photolithography systemCHARTERED SEMICONDUCTOR MFG·Filed 2005·Granted Jul 14, 2009·9 cites·20 claims
- 0274US7655388B2Mask and method to pattern chromeless phase lithography contact holeCHARTERED SEMICONDUCTOR MFG·Filed 2005·Granted Feb 2, 2010·4 cites·36 claims
- 0373US7014962B2Half tone alternating phase shift masksCHARTERED SEMICONDUCTOR MFG·Filed 2003·Granted Mar 21, 2006·13 cites·57 claims
- 0472US8057968B2Mask and method to pattern chromeless phase lithography contact holeTAN SIA KIM·Filed 2010·Granted Nov 15, 2011·2 cites·25 claims
- 0566US7926000B2Integrated circuit system employing dipole multiple exposureCHARTERED SEMICONDUCTOR MFG·Filed 2007·Granted Apr 12, 2011·2 cites·10 claims
- 0665US7867698B2Reticle system for manufacturing integrated circuit systemsCHARTERED SEMICONDUCTOR MFG·Filed 2008·Granted Jan 11, 2011·2 cites·32 claims
- 0759US7445874B2Method to resolve line end distortion for alternating phase shift maskCHARTERED SEMICONDUCTOR MFG·Filed 2004·Granted Nov 4, 2008·5 cites·35 claims
- 0858US7556891B2Method and apparatus for contact hole unit cell formationCHARTERED SEMICONDUCTOR MFG·Filed 2004·Granted Jul 7, 2009·5 cites·20 claims
- 0957US7384714B2Anti-reflective sidewall coated alternating phase shift mask and fabrication methodCHARTERED SEMICONDUCTOR MFG·Filed 2004·Granted Jun 10, 2008·4 cites·24 claims
- 1055US7836420B2Integrated circuit system with assist featureCHARTERED SEMICONDUCTOR MFG·Filed 2007·Granted Nov 16, 2010·1 cites·20 claims
- 1154US8413083B2Mask system employing substantially circular optical proximity correction target and method of manufacture thereofTAN SIA KIM·Filed 2009·Granted Apr 2, 2013·1 cites·20 claims
- 1253US7421676B2System and method for phase shift assignmentCHARTERED SEMICONDUCTOR MFG·Filed 2004·Granted Sep 2, 2008·3 cites·16 claims
- 1352US7923180B2Cross technology reticlesCHARTERED SEMICONDUCTOR MFG·Filed 2009·Granted Apr 12, 2011·0 cites·18 claims
- 1450US7649612B2Phase shifting photolithography systemCHARTERED SEMICONDUCTOR MFG·Filed 2006·Granted Jan 19, 2010·0 cites·20 claims
- 1549US9395621B2Pellicles and devices comprising a photomask and the pellicleGLOBALFOUNDRIES SG PTE LTD·Filed 2014·Granted Jul 19, 2016·0 cites·20 claims
- 1649US8896810B2Liquid immersion scanning exposure system using an immersion liquid confined within a lens hoodZHOU WENZHAN·Filed 2009·Granted Nov 25, 2014·0 cites·20 claims
- 1748US7866224B2Monitoring structureCHARTERED SEMICONDUCTOR MFG·Filed 2006·Granted Jan 11, 2011·0 cites·11 claims
- 1847US7674562B2Angled-wedge chrome-face wall for intensity balance of alternating phase shift maskCHARTERED SEMICONDUCTOR MFG·Filed 2005·Granted Mar 9, 2010·0 cites·9 claims
- 1947US7288366B2Method for dual damascene patterning with single exposure using tri-tone phase shift maskCHARTERED SEMICONDUCTOR MFG·Filed 2003·Granted Oct 30, 2007·2 cites·9 claims
- 2043US8034543B2Angled-wedge chrome-face wall for intensity balance of alternating phase shift maskGLOBAL FOUNDRIES SINGAPORE PTE LTD·Filed 2010·Granted Oct 11, 2011·0 cites·18 claims
- 2143US8003311B2Integrated circuit system employing multiple exposure dummy patterning technologyGLOBALFOUNDRIES SG PTE LTD·Filed 2008·Granted Aug 23, 2011·0 cites·20 claims
- 2239US8048588B2Method and apparatus for removing radiation side lobesGLOBALFOUNDRIES SG PTE LTD·Filed 2004·Granted Nov 1, 2011·0 cites·20 claims
- 2338US2006105520A1Structure and method to fabricate a protective sidewall liner for an optical maskTAN SIA K·Filed 2004·Application pending·0 cites
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