Inventor · disambiguated record
Alferd Cofer
Also filed as: COFER ALFERD
17 granted patents·345 citations·filing 1996–2006
95Inventor score
Technology areasH10P
Top patents by PatentIndex Score
17 records- 0187US6190496B1Plasma etch reactor and method for emerging filmsTEGAL CORP·Filed 1999·Granted Feb 20, 2001·68 cites·48 claims
- 0286US7459100B2Methods and apparatus for sequentially alternating among plasma processes in order to optimize a substrateLAM RES CORP·Filed 2004·Granted Dec 2, 2008·40 cites·24 claims
- 0386US6354240B1Plasma etch reactor having a plurality of magnetsTEGAL CORP·Filed 1998·Granted Mar 12, 2002·57 cites·26 claims
- 0483US6048435APlasma etch reactor and method for emerging filmsTEGAL CORP·Filed 1996·Granted Apr 11, 2000·58 cites·45 claims
- 0576US7223699B2Plasma etch reactor and methodTEGAL CORP·Filed 2005·Granted May 29, 2007·3 cites·20 claims
- 0668US7351664B2Methods for minimizing mask undercuts and notches for plasma processing systemLAM RES CORP·Filed 2006·Granted Apr 1, 2008·3 cites·30 claims
- 0768US6620335B1Plasma etch reactor and methodTEGAL CORP·Filed 1999·Granted Sep 16, 2003·23 cites·19 claims
- 0867US6905969B2Plasma etch reactor and methodTEGAL CORP·Filed 2002·Granted Jun 14, 2005·7 cites·17 claims
- 0960US6774046B2Method for minimizing the critical dimension growth of a feature on a semiconductor waferTEGAL CORP·Filed 2001·Granted Aug 10, 2004·6 cites·16 claims
- 1059US6492280B1Method and apparatus for etching a semiconductor wafer with features having vertical sidewallsTEGAL CORP·Filed 2000·Granted Dec 10, 2002·7 cites·41 claims
- 1158US6958295B1Method for using a hard mask for critical dimension growth containmentTEGAL CORP·Filed 2000·Granted Oct 25, 2005·5 cites·36 claims
- 1257US6287975B1Method for using a hard mask for critical dimension growth containmentTEGAL CORP·Filed 1998·Granted Sep 11, 2001·21 cites·7 claims
- 1356US6127277AMethod and apparatus for etching a semiconductor wafer with features having vertical sidewallsTEGAL CORP·Filed 1996·Granted Oct 3, 2000·21 cites·44 claims
- 1455US6410448B1Plasma etch reactor and method for emerging filmsTEGAL CORP·Filed 1999·Granted Jun 25, 2002·15 cites·15 claims
- 1551US6500314B1Plasma etch reactor and methodTEGAL CORP·Filed 1996·Granted Dec 31, 2002·11 cites·61 claims
- 1642US7985688B2Notch stop pulsing process for plasma processing systemLAM RES CORP·Filed 2005·Granted Jul 26, 2011·0 cites·31 claims
- 1740US6951820B2Method for using a hard mask for critical dimension growth containmentSILICON VALLEY BANK·Filed 2001·Granted Oct 4, 2005·0 cites·10 claims
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